2015
DOI: 10.1103/physrevb.91.064103
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Point defect stability in a semicoherent metallic interface

Abstract: We present a comprehensive density functional theory (DFT)-based study of different aspects of one vacancy and He impurity atom behavior at semicoherent interfaces between the low-solubility transition metals Cu and Nb. Such interfaces have not been previously modeled using DFT. A thorough analysis of the stability and mobility of the two types of defects at the interfaces and neighboring internal layers has been performed and the results have been compared to the equivalent cases in the pure metallic matrices… Show more

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Cited by 23 publications
(19 citation statements)
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“…Moreover, considering their important contribution in processes like migration and clustering of defects in the host matrix, defect-defect and host-defect interactions were also studied in detail. The results of our study agree well with the previous literature 29 , 31 in predicting MDI regions to be the most stable sites for monovacancy and isolated He interstitials. Considering the importance of He trapping on the performance of materials properties, the formation of metallic monovacancy and He atom complexes (up to 5He atoms) at the MDI region of the interfacial layers were also studied.…”
Section: Introductionsupporting
confidence: 92%
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“…Moreover, considering their important contribution in processes like migration and clustering of defects in the host matrix, defect-defect and host-defect interactions were also studied in detail. The results of our study agree well with the previous literature 29 , 31 in predicting MDI regions to be the most stable sites for monovacancy and isolated He interstitials. Considering the importance of He trapping on the performance of materials properties, the formation of metallic monovacancy and He atom complexes (up to 5He atoms) at the MDI region of the interfacial layers were also studied.…”
Section: Introductionsupporting
confidence: 92%
“…On the other hand, He-interstitial finds enough free space to accommodate at interfacial MDI, and that is the reason why formation energy (2.48 eV ) for both layers is less than at NON-MDI region (3.48 eV and 3.22 eV for Cu4 and Nb4 respectively), as explained before 31 . But if we insert a He atom in the Cu3 or Nb3 layers, because of the similar lattice environment, the available space for the interstitial He atom will be almost same for both MDI (3.50 eV at Cu3 and 3.54 eV Nb3) and NON-MDI (3.42 eV at Cu3 and 3.52 eV Nb3) region of that particular layer.…”
Section: Resultsmentioning
confidence: 78%
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“…For example, Tschopp, Solanki and coworkers have performed extensive atomistic simulations to investigate the effects of GB character on the formation energetics of point defects, such as vacancy922232430, self-interstitial9, hydrogen2526, helium2627, carbon2628 and various other impurities2326. Aiming to mitigate radiation damage, Uberuaga, Demkowicz and coworkers have conducted massive multiscale simulations193132333435363738 to understand the effects of interface structure on point defect segregation, defect mobility, defect recombination and GB sink efficiency. Jiang et al 29.…”
mentioning
confidence: 99%
“…The mechanisms underlying point defect annihilation at Cu/Nb interfaces have been studied recently by density functional theory (DFT) [47], molecular dynamics [1,11,21,27,34,35,48], and phase field calculations [37]. This provided considerable detail on the atomistic processes taking place on relatively short time scales.…”
Section: Introductionmentioning
confidence: 99%