Playing with sizes and shapes of colloidal particles via dry etching methods

Fiber Optic Plasmonic Sensors Based on Nanodome Arrays with Nanogaps

“…The morphology of PS beads could be adjusted by controlling the gas type, flow rate, and equipment power. 30 To define the nanogap around the nanodome, a controllable polymer nanolayer was coated on the fiber optic end-face (Figure 1c). To achieve excellent film quality, one layer of poly(ethyleneimine) (PEI) was formed, and poly(sodium 4-styrenesulfonate) (PSS) and poly(allylamine hydrochloride) (PAH) were sequentially piled.…”

Pre- and post-assembly modifications of colloidal plasmonic arrays: the effect of size distribution, composition and annealing

“…19,20 Moreover, the production of multiple elastomeric replicas of the original master dramatically reduces the impact of the its fabrication cost, which can be realized by standard lithographic technique such as electronbeam lithography, or with more cost-effective approaches such as nanosphere lithography. 21 The versatility of templated self-assembly has been exploited for the fabrication of complex functional devices, such as mechanotunable plasmonic devices, 22 chirally active substrates, 23 and multicomponent architectures for plasmon-enhanced upconversion luminescence. 24 Moreover, several applications have been targeted using templated self-assembled structures, including surface-enhanced Raman scattering, 25,26 tumor monitoring, 27 and catalysis.…”

“…19,20 Moreover, the production of multiple elastomeric replicas of the original master dramatically reduces the impact of the its fabrication cost, which can be realized by standard lithographic technique such as electron-beam lithography, or with more cost-effective approaches such as nanosphere lithography. 21…”

Ultra‐Sensitive β‐Ga2O3 Solar‐Blind Photodetector with High‐Density Al@Al2O3 Core−Shell Nanoplasmonic Array

“…In this work, we report β‐Ga 2 O 3 solar‐blind PDs with Al@Al 2 O 3 core−shell nanostructure arrays fabricated by the nanosphere lithography (NSL), which enables the realization of tunable periodic nanostructure patterns over a large area with extraordinarily small feature size and wafer‐scale uniformity [ 35 ] and thus is widely regarded to have great potential to replace, at least partially, complex and high‐cost advanced lithographic techniques in some specific fields. [ 36,37 ] As a result, sharp plasmon resonance peaked at 235–240 nm in the solar‐blind DUV region is sustained, leading to an ultrahigh D * (4.22 × 10 15 Jones), outperforming those of almost all the previously‐reported film‐type Gallium oxide PDs, and a responsivity as high as 216.0 A W −1 with an enhancement factor up to 420%. The comparison of experimental data with finite‐difference time‐domain (FDTD) calculations clearly attributes the sensitivity enhancement to the LSPR effect with an emphasis on the critical contribution of nanostructure density.…”