2008
DOI: 10.1063/1.2999370
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Plasmon resonances of aluminum nanoparticles and nanorods

Abstract: We report experimental and theoretical analysis of the plasmonic resonances of Al nanoparticles and nanorods. Ordered nanoparticle arrays with well-defined shapes and narrow size distributions are fabricated on quartz substrates over large areas using extreme ultraviolet interference lithography. The structures, which have sizes down to 40 nm, exhibit strong and sharp particle plasmon resonances in the near and deep-UV ranges. A comprehensive theoretical analysis carried out using dipolar approximation and fin… Show more

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Cited by 225 publications
(173 citation statements)
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“…For display purposes, a viewing angle-dependent signal would be problematic but could be remedied by placing a diffusing layer on top of the pixel layer. Although the standard electron beam lithography methods used in this work are not currently scalable to industrial requirements, nanorods of similar sizes have been produced by extreme UV lithography (21), which uses an interference mask, a coherent light source, and otherwise standard lithography techniques. This combination of highly tunable, vibrant RGB colors, a highly polarized response, and potential industrial scalability suggests that the Al plasmonic pixel is a promising platform for future display technologies in the notso-distant future.…”
Section: Discussionmentioning
confidence: 99%
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“…For display purposes, a viewing angle-dependent signal would be problematic but could be remedied by placing a diffusing layer on top of the pixel layer. Although the standard electron beam lithography methods used in this work are not currently scalable to industrial requirements, nanorods of similar sizes have been produced by extreme UV lithography (21), which uses an interference mask, a coherent light source, and otherwise standard lithography techniques. This combination of highly tunable, vibrant RGB colors, a highly polarized response, and potential industrial scalability suggests that the Al plasmonic pixel is a promising platform for future display technologies in the notso-distant future.…”
Section: Discussionmentioning
confidence: 99%
“…Al is low in cost and compatible with mainstream manufacturing processes in the electronics industry (complementary metal-oxide semiconductor processing, known as CMOS) (12, 13). Al has recently been identified as a highly promising chromatic material for color filters, for instance using structures such as hole arrays (14-16) or arrays of Al crosses (17).Although the plasmon resonances of Al nanostructures typically have been studied in the UV region of the spectrum (18), they can also be tuned into the visible region (19,20), exhibiting a sensitivity to size and shape similar to Au and Ag nanostructures (21,22). The structural tuning of the Al plasmon resonance into the visible yields excellent blue colors, but as the resonance is red-shifted across the visible spectrum its linewidth broadens, primarily owing to the interband transition of Al that occurs at nominally 1.5 eV.…”
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confidence: 99%
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“…The height of the nanorods is 35 nm for all pixels, and all nanorod widths are designed to be 40 nm for compatibility with scalable fabrication methods, such as nanoimprint, 35,[37][38][39][40][41][42] laser interference, [43][44][45] or extreme ultraviolet lithography. 46,47 All samples are prepared using standard e-beam lithography on an indium tin oxide (ITO) coated glass substrate, followed by the spincoating of a layer of polyimide (PI), as shown in the main portion of Figure 1a. After fabrication, the pixels are then spectrally characterized using dark field excitation with p-polarized light oriented along the longitudinal axis of the nanorods.…”
Section: Resultsmentioning
confidence: 99%
“…1,25,32 Still, localized plasmon resonances in Al have been demonstrated in several geometries, including nanoparticles, 27,30,33 triangles, 3,28,34 discs, 4,35,36 rods, and nanoantennas. 31,37,38 The relative abundance of Al can be advantageous for the design of plasmonic absorbers in solar energy conversion or for inexpensive, disposable SERS and fluorescence-enhancing substrates. Due to complementary metal oxide semiconductor (CMOS) compatibility, Al plasmonic nanostructures would be optimal for siliconintegrated optoelectronic applications, such as integrated biomolecular sensing, 39,40 on-chip plasmonic nanoantennas, waveguides, and interconnects.…”
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confidence: 99%