Thin plasma polymerized films of tetramethyl germanium are deposited at various substrate temperatures. The influence of substrate temperature on the deposition rate, composition, structure, and electrical properties of the films is discussed. With an increase in the substrate temperature from 25°C to 150°C under similar plasma deposition conditions, the conductivity of the film increased by four orders of magnitude. Films of plasma polymerized tetramethyl germanium deposited at 150°C show typical se…
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