Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications

Orabona, Emanuele; Caliò, Alessandro; Rendina, Ivo; Stefano, Luca De; Medugno, Mario

doi:10.3390/mi4020206

Cited by 9 publications

(5 citation statements)

References 19 publications

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“…However, they have high-cost fabrication [14]. Several authors have conducted studies where inexpensive photomasks are used in order to reduce the overall costs of the photomasks fabrication (including facilities) and, consequently, of the photolithographic processes [15,16]. Despite portraying the need for low-cost technologies these approaches use specific equipment and relatively complex processes.…”

Section: Uv Exposurementioning

confidence: 99%

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

et al. 2014

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Abstract:The study and optimization of epoxy-based negative photoresist (SU-8) microstructures through a low-cost process and without the need for cleanroom facility is presented in this paper. It is demonstrated that the Ultraviolet Rays (UV) exposure equipment, commonly used in the Printed Circuit Board (PCB) industry, can replace the more expensive and less available equipment, as the Mask Aligner that has been used in the last 15 years for SU-8 patterning. Moreover, high transparency masks, printed in a photomask, are used, instead of expensive chromium masks. The fabrication of well-defined SU-8 microstructures with aspect ratios more than 20 is successfully demonstrated with those facilities. The viability of using the gray-scale technology in the photomasks for the fabrication of 3D microstructures is also reported. Moreover, SU-8 microstructures for different applications are shown throughout the paper.

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Section: Uv Exposurementioning

confidence: 99%

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

et al. 2014

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“…Also, scalars α and γ depend on the physical parameters of the system such as the lens powers and the distances between the optical components. In practice, the kernel K(x) can be implemented by a Spatial Light Modulator (SLM) [1] which is a programmable transmissive mask (Figure 2) or microfabrication [15] and aerosoljet printing [26] which result in a fixed mask but with much higher resolution and miniature size. Also, when high precision is not required, inkjet printing on transparent substrates is a low-cost option [22].…”

Section: Training An Optical Kernel For Preserving Privacymentioning

confidence: 99%

Privacy-Preserving Image Acquisition Using Trainable Optical Kernel

Sepehri,

Pad,

Frossard

et al. 2021

Preprint

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Preserving privacy is a growing concern in our society where sensors and in particular cameras are ubiquitous. In this work, for the first time, we propose a trainable image acquisition method that removes the sensitive identity revealing information in the optical domain before it reaches the image sensor. The method benefits from a trainable optical convolution kernel which transmits the desired information while filters out the sensitive information. As the sensitive information is suppressed before it reaches the image sensor, it does not enter the digital domain therefore is unretrievable by any sort of privacy attack. This is in contrast with the current digital privacy-preserving methods that are all vulnerable to direct access attack. Also, in contrast with the previous optical privacy-preserving methods that cannot be trained, our method is data-driven and optimized for the specific application at hand. Moreover, there is no additional computation, memory, or power burden on the acquisition system since this processing happens passively in the optical domain and can even be used together and on top of the fully digital privacy-preserving systems. The proposed approach is generic and adaptable to different digital neural networks, and desired and sensitive content pairs. We demonstrate our new method for several scenarios such as smile detection as the desired attribute while the gender is filtered out as the sensitive content. We trained the optical kernel in conjunction with two adversarial neural networks where the analysis network tries to detect the desired attribute and the adversarial network tries to detect the sensitive content. We show that this method is able to reduce 65.1% of sensitive content when it is selected to be the gender and as the kernel is optimized, it only causes 7.3% reduction of the desired information content. Moreover, we reconstruct the original faces using the deep image reconstruction method that confirms the ineffectiveness of reconstruction attacks to obtain the sensitive content.

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“…Although great resolutions have been made possible with advances in microfabrication, simple and rapid fabrication processes are thus currently necessary for complex, personalized masksets fabrication [1]. Printing the desired pattern on acetates or projecting them on a substrate with a commercial projector are rapid, low-cost solutions that are generally used to produce custom-made masks, but they only offer a limited resolution in the majority of the cases [2,3]. Moreover, printed masks may be susceptible to degradation by exposure to ultraviolet light or to the environment.…”

Section: Introductionmentioning

confidence: 99%

Rapid fabrication of on-demand high-resolution optical masks with a CD–DVD pickup unit

et al. 2014

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A low-cost, direct fabrication technique with a micrometer range resolution has been implemented for rapid prototyping of optical masks for photolithography and structured light and diffraction optics applications. Using a setup based on the optical unit of a compact disc-digital versatile disc burner, a low-energy infrared laser beam was focused on a thin polymeric layer with embedded absorbing carbon nanopowder coated on a transparent glass substrate. This allowed for the generation of a custom-made transparent pattern in a computer numerical control fashion. In addition to its great simplicity and repeatability, the method also enables grayscale contrasts for each pixel individually, and fabricated masks proved to resist high intensities.

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Photomasks Fabrication Based on Optical Reduction for Microfluidic Applications

Cited by 9 publications

References 19 publications

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

Privacy-Preserving Image Acquisition Using Trainable Optical Kernel

Rapid fabrication of on-demand high-resolution optical masks with a CD–DVD pickup unit

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