Photographic Relief Images*

Smith, Harry D.

doi:10.1364/josa.58.000533

Cited by 85 publications

(28 citation statements)

References 6 publications

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“…The principles of the technique may be found elsewhere [23,24]. In brief, ellipsometry measures the change in the polarization state of light caused by the reflection from a single interface, a series of parallel interfaces or a gradient interface.…”

Section: Spectroscopic Ellipsometry Analysismentioning

confidence: 99%

Absorption of Cetylpyridinium Chloride into Poly(N-isopropylacrylamide)-Based Microgel Particles, in Dispersion and as Surface-Deposited Monolayers

et al. 2007

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Section: Spectroscopic Ellipsometry Analysismentioning

confidence: 99%

Absorption of Cetylpyridinium Chloride into Poly(N-isopropylacrylamide)-Based Microgel Particles, in Dispersion and as Surface-Deposited Monolayers

et al. 2007

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“…SE is a highly surface-sensitive technique which enables detection of not only submonolayer coverage of a surface by adsorbed species 28,29 but also the surface roughness of its size smaller than the wavelength of light. 30 An ambient-type AFM does not require special care in sample preparation but has sufficient resolution for evaluating atomic-scale roughness.…”

Section: Introductionmentioning

confidence: 99%

Properties of GaP(001) surfaces chemically treated in NH4OH solution

Morota

Adachi

2006

Journal of Applied Physics

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Chemically cleaned GaP͑001͒ surfaces in 25% NH 4 OH solution have been studied using spectroscopic ellipsometry ͑SE͒, ex situ atomic force microscopy ͑AFM͒, x-ray photoelectron spectroscopy ͑XPS͒, and wettability measurement techniques. The SE data clearly indicate that the solution causes removal of the native oxide film immediately upon immersing the sample. The SE data also indicate that when the native oxide film is completely etch removed, the resulting surface is still roughened. The estimated roughness thickness is ϳ1.2 nm, in excellent agreement with the AFM rms value ͑ϳ1.2 nm͒. The XPS spectra confirm the removal of the native oxide from the GaP surface. The XPS data also suggest a thin oxide overlayer, ϳ0.3 nm thick, on the etch-cleaned GaP surface. The wettability measurements indicate that the as-degreased surface is hydrophobic, while the NH 4 OH-cleaned surface is hydrophilic. This result is in direct contrast to those obtained from acid cleaned surfaces, which are usually hydrophobic. The origin of hydrophilicity may be singular and associated hydroxyl groups bonded on the GaP surface.

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“…One has to use a specimen with a broad spectrum of frequenci es in the vicinity of the resolution limit. In one uses the granularity in 4 (1978) mirror Diffractograms with higher diffracted to a factor 10) are obtainable the phase shift of the photographic emulsion caused thickness and density variations of the gelatine layer 1967, Smith 1968, Reimer et al 1973.…”

Section: Information Aboutmentioning

confidence: 99%