PEN as substrate for new solar cell technologies

Abstract

The possible use of poly(ethylene naphthalate) as substrate for thin silicon solar cells has been studied in this paper. The transparency of this polymer makes it a candidate to be used in both substrate and superstrate configurations. ZnO:Al has been deposited at room temperature on top of PEN. The resulting structure PEN/ZnO:Al presented good optical and electrical properties. PEN has been successfully textured (nanometer and micrometer random roughness) using Hot-Embossing Lithography. Reflector structures have been built depositing Ag and ZnO:Al on top of the stamped polymer. The deposition of these layers did not affect the final roughness of the whole. The reflector structure has been morphologically and optically analysed to verify its suitability to be used in solar cells.

Control of doped layers in p–i–n microcrystalline solar cells fully deposited with HWCVD

“…Material with higher amount of amorphous phase (X c  0.4) has a lower initial defect density, but this defect density increases after long light exposure [7]. Oxygen concentration in these samples measured by SIMS was of approximately 6·10 18 cm -3 and mainly imputable to impurities coming from the walls of the deposition chamber.…”

“…Intrinsic layers, in all cases, have been deposited using the conditions leading to stable devices reported in [7], and only the deposition time has been changed in order to vary the i-layer thickness. …”

Synthesis and Characteristics of Valeric Acid-Zinc Layered Hydroxide Intercalation Material for Insect Pheromone Controlled Release Formulation

“…The interlayer anions can be exchanged with various organic and inorganic charged compounds. ZLH is an interesting host nanomaterial due to the fact that its anion exchange ability has led to the formation of various nanocomposite materials in multiple applications such as catalyst host [9], surfactant nanomaterial [10], and sensors and photoelectrical devices [11].…”

UV-nanoimprint lithography and large area roll-to-roll texturization with hyperbranched polymer nanocomposites for light-trapping applications

“…In the case of soft thermoplastic substrates, thermal nanoimprint lithography enabled replication of the mold patterns, however with a limited shape fidelity. In addition, the high pressure ( $ 200 bar) and high temperature ( $ 200 1C) [11] required to imprint the polymer surface could make it not cost effective [11][12][13]. Ultraviolet nanoimprint lithography (UVNIL) is a wellestablished process for the replication of sub-micron scale features into photopolymerizable resins.…”