Patterning of photocleavable zwitterionic polymer brush fabricated on silicon wafer

UV‐Patterning of Anti‐Biofouling Zwitterionic Copolymer Layer with an Aromatic Anchor Group

“…This result suggests that poly(CMB‐ r ‐STMS) was decomposed at a low irradiation dose, which does not affect the surface modified with poly(CMB‐ r ‐MPTMS). This is in good agreement with the previous result obtained for a polymer brush having an aromatic ring at its base: the covalent binding between the polymer brush and the substrate could be more easily cleaved with the introduction of an aromatic ring …”

“…However, the presence or absence of 10% trimethoxysilyl group does not seem to affect the wettability of the copolymer‐modified surface significantly. With the sol–gel reaction, the hydrophilic CMB residues might be relatively more exposed to the solution phase, which would mainly lead to an increase in hydrophilicity of the surface …”

“…The nonspecific adsorption of BSA on the copolymer layer on the glass substrate and the silicon wafer was evaluated using the bicinchoninic acid (BCA) method reported elsewhere …”

“…However, the existing surface modification methods cannot contribute effectively to the development of novel biological materials, and the materials and methods for achieving surface modification, which provide excellent functionalities and abilities to the modified materials, should be intensively investigated . Moreover, optical microfabrication techniques involving irradiation with UV light and ion beams have been combined with surface modification techniques using polymers to obtain functional surfaces.…”

“…Moreover, optical microfabrication techniques involving irradiation with UV light and ion beams have been combined with surface modification techniques using polymers to obtain functional surfaces. In a previous study, a polymer brush possessing an aromatic ring in the base was used for fabricating a micropattern (≈5 µm) at an excimer laser (ArF, 193 nm) exposure lower than that required for a polymer brush without an aromatic ring in the base . By the introduction of aromatic ring into the anchoring group, the energy of UV is intensively and selectively absorbed to the aromatic ring.…”