2003
DOI: 10.1021/la034527b
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Pattern Replication by Confined Dewetting

Abstract: The dewetting of a polymer film in a confined geometry was employed in a pattern-replication process. The instability of dewetting films is pinned by a structured confining surface, thereby replicating its topographic pattern. Depending on the surface energy of the confining surface, two different replication mechanisms were found, leading to a choice of either a negative or a positive replication mechanism of a patterned plate.

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Cited by 57 publications
(58 citation statements)
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“…Confinement of a soft liquid [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] or a soft solid surface by external fields and residual stresses [11,12,33,34] often engenders the surface instability and self-organized patterning of the film surface. Such instabilities can also be often controlled and guided, [3][4][5][6]9,10,[12][13][14][15][16][17]28,[36][37][38][39] which may allow their potential technological use in the applications involving meso-scale patterning of soft materials.…”
Section: Introductionmentioning
confidence: 99%
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“…Confinement of a soft liquid [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] or a soft solid surface by external fields and residual stresses [11,12,33,34] often engenders the surface instability and self-organized patterning of the film surface. Such instabilities can also be often controlled and guided, [3][4][5][6]9,10,[12][13][14][15][16][17]28,[36][37][38][39] which may allow their potential technological use in the applications involving meso-scale patterning of soft materials.…”
Section: Introductionmentioning
confidence: 99%
“…Such instabilities can also be often controlled and guided, [3][4][5][6]9,10,[12][13][14][15][16][17]28,[36][37][38][39] which may allow their potential technological use in the applications involving meso-scale patterning of soft materials. Of particular interest here is the surface of a soft thin elastic film, which, when brought in adhesive proximity of another rigid flat surface, undergoes spontaneous roughening with the formation of a short-wave isotropic structure.…”
Section: Introductionmentioning
confidence: 99%
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“…Recently, several soft-lithographic methods were devised that minimize the contact between the template and a liquid resist layer. [2][3][4][5][6] In these techniques a capillary film instability is directed towards the protrusions of a template facing a liquidpolymer film. The polymer is drawn towards these protrusions, thereby creating a positive replica of the template.…”
Section: Introductionmentioning
confidence: 99%
“…Several works on controlled self-organization during dewetting for engineering of nano-and micrometer patterns in thin liquid films have been reported. [17,20,21] In a recent work, in particular, we demonstrated a lithography technique for the fabrication of monochromatic organic light-emitting diode (OLED) pixel arrays, [14] in which organic materials are patterned with defined features by exploiting the instability phenomena affecting a liquid thin film on a nonwetting surface. [22] Such a method allows us to exploit the organizational capability of molecules, driven by external stimuli, to define well-resolved patterns on large-area substrates.…”
mentioning
confidence: 99%