2006
Optically Transparent, Ultrathin Pt Films as Versatile Metal Substrates for Molecular Optoelectronics
Abstract: This contribution reports a simple, straightforward method (cool sputtering) of fabricating robust, homogeneous, conductive, and optically transparent ultrathin Pt films. Their morphological, structural, mechanical, electrical, and optical properties are reported. The morphology and structure of these Pt films are investigated by scanning electron microscopy, transmission electron microscopy, atomic force microscopy, and X‐ray diffraction. The ultrathin Pt films, approximately 20 nm thick, are characterized by…
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Cited by 41 publications
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Abstract
Smart CitationsHow this paper cites the one you are viewing
“…), acting as the adsorption center and seeds to promote the nucleation of host metals, is an effective way to obtain UTMFs with small roughness. [66][67][68] The inset SEM images (without (left) and with a Cu seed layer (right), the scale bars are 500 nm) and the plot in Fig. 5a demonstrate that after 1 nm of Cu seed layer depositing, atomically smooth and stable Ag films with 0.5 nm roughness on silica substrate were successfully fabricated.…”
Section: Figure 4 the Schematic Illustration Of General Growth Models Of Metal Films
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confidence: 89%
Abstract
Smart CitationsHow this paper cites the one you are viewing
“…), acting as the adsorption center and seeds to promote the nucleation of host metals, is an effective way to obtain UTMFs with small roughness. [66][67][68] The inset SEM images (without (left) and with a Cu seed layer (right), the scale bars are 500 nm) and the plot in Fig. 5a demonstrate that after 1 nm of Cu seed layer depositing, atomically smooth and stable Ag films with 0.5 nm roughness on silica substrate were successfully fabricated.…”
Section: Figure 4 the Schematic Illustration Of General Growth Models Of Metal Films
mentioning
confidence: 89%
“…), acting as the adsorption center and seeds to promote the nucleation of host metals, is an effective way to obtain UTMFs with small roughness. 66–68 …”
Section: Plasmonic Ultra-thin Metal Films
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confidence: 99%
Abstract
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“…Silver (Ag), Gold (Au), Chromium (Cr), Nickel (Ni) and Platinum (Pt) films and metal bi-layers with the thickness of some nanometers expose both a high conductivity and a high transparency and can compete with ITO films in terms of their opto-electronic performance. [76][77][78][79] O'Connor et al [80] reported, that a photovoltaic cell with a 9 nm thick evaporated silver (Ag) electrode displayed an even slightly higher efficiency than the ITO reference cell (see Figure 6). Thin films evaporated from a Ca:Ag blend were reported to display a sheet resistance of 27 Ohm sq -1 at 93 % transmittance (FoM 190) [81] and OPV devices based on these Ca:Ag electrodes showed a higher efficiency than the ITO reference device, but underwent rapid degradation.…”
Section: Thin Metal Films
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confidence: 99%
Abstract
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“…(3), were also considered in the literature. 139 Bare PT (6) in VMP decouples light and matter degrees of freedom, i.e. each contribution is a product of two correlation functions (electron and photon), which have to be evaluated independently.…”
Section: Liouville Space Formulation
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confidence: 99%
“…This was shown in studies considering radiation field both classically 155,157 and quantum mechanically. 193 Finally, the fact that, e.g., electron Green functions G enters expressions for both fluxes, 6 Eqs. ( 8) and ( 9), indicates inter-dependence of the fluxes and demonstrates a necessity of consistent (i.e.…”
Section: Hilbert Space Formulations
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confidence: 99%
