2012
DOI: 10.1016/j.apsusc.2011.10.077
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Optical and electrical properties of laser doped Si:B in the alloy range

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Cited by 13 publications
(7 citation statements)
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“…Please note that in all experiments, the photoemission of unreconstructed heavily doped diamond surfaces could be analyzed as representative of the bulk of the crystal. Finally, since most free carrier concentrations given in tables 1 and 2 correspond to a plasmon frequency p lying in the near or mid-infrared range, optical spectroscopies have also been applied to SnTe and 100 GeTe, as well as to heavily doped silicon 114 and diamond [115][116][117] . A simple interpretation of the plasmon edge within the Drude model has been found sufficient in most cases to yield carrier concentrations and damping factors = -1 typical of overdamped dilute metals, with relaxation times  in the 0.2 to 10 fs range fully compatible with the mean free path values given in table 2, generally lower than 1 nm in diamond, as confirmed by ARPES measurements 111 .…”
Section: D Normal State Propertiesmentioning
confidence: 99%
“…Please note that in all experiments, the photoemission of unreconstructed heavily doped diamond surfaces could be analyzed as representative of the bulk of the crystal. Finally, since most free carrier concentrations given in tables 1 and 2 correspond to a plasmon frequency p lying in the near or mid-infrared range, optical spectroscopies have also been applied to SnTe and 100 GeTe, as well as to heavily doped silicon 114 and diamond [115][116][117] . A simple interpretation of the plasmon edge within the Drude model has been found sufficient in most cases to yield carrier concentrations and damping factors = -1 typical of overdamped dilute metals, with relaxation times  in the 0.2 to 10 fs range fully compatible with the mean free path values given in table 2, generally lower than 1 nm in diamond, as confirmed by ARPES measurements 111 .…”
Section: D Normal State Propertiesmentioning
confidence: 99%
“…1(b)). This could be attributed to the imperfect dopant diffusion in the melted layer induced by a single laser shot, as was already shown in Si:B laser doped systems, 14 confirming the necessity of an efficient doping process.…”
mentioning
confidence: 77%
“…14,15 As the dose of active dopants is determined exclusively by the number of laser shots, the doping depth can be independently tuned by controlling the laser energy. Above the Ge melting threshold ($250 mJ/cm 2 ), we can thus linearly increase the melted depth up to a few hundreds of nanometers.…”
mentioning
confidence: 99%
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“…[18][19][20][21][22] Here we address both of these challenges by developing a new fabrication method for efficient silicon light-emitting diodes using an original doping technique, gas immersion laser doping (GILD), and investigate spin-dependent recombination in silicon LEDs (SiLEDs). The GILD process [23][24][25][26] allows us to reach doping levels well beyond the solubility threshold which, as we describe below, gives rise to efficient emission, while retaining the well-defined planar geometry necessary to align electric and magnetic fields. Using our SiLEDs, we find that when classical MR effects are suppressed, electroluminescence can be substantially enhanced under a magnetic field near room temperature.…”
Section: Introductionmentioning
confidence: 99%