volume 90, issue 2, P211-217 2007
DOI: 10.1007/s00339-007-4325-x
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Abstract: International audienceFemtosecond pulsed laser ablation has been used for the deposition of various thin films by co-ablating pure graphite and pure metallic targets (nickel or tantalum) under vacuum conditions with an amplified Ti:sapphire laser working at 800 nm, with about 1.5 mJ per pulse at a repetition rate of 1 kHz. The plasma plume created during the femtosecond pulsed laser deposition process has been investigated, by fast imaging and spectroscopic characterizations, depending on the ablated target an…

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