volume 32, issue 20, P1500-1508 1992
DOI: 10.1002/pen.760322010
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Abstract: Abstract Novolak resins provide the best overall performance for “g” and “i”‐line photoresists. There is a continuing need for advanced novolak designs that will provide improved lithographic, thermal, and etch characteristics that may be reproducibly synthesized. A novolak synthesis process was developed using the solution condensation technique. Cresol mixtures with m‐cresol and 3,5‐xylenol at specific ratios provide reproducible novolaks with controlled molecular weights. In order to achieve high thermal a…

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