volume 32, issue 20, P1494-1499 1992
DOI: 10.1002/pen.760322009
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Abstract: Abstract Novolak resins have been optimized for high performance positive photoresists. Low molecular weight novolak resins are the key components for improving resolution capability, sensitivity, and heat resistance of positive photoresists. Various phenolic compounds (monomers) and oligomers of metacresol novolak resins were evaluated as low molecular weight components. It was found that phenolic compounds that have moderate hydrophobicity and azocoupling capability with diazonaphthaoquinone compounds great…

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