2016
DOI: 10.1038/srep29625
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Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication

Abstract: It is very difficult to realize sub-3 nm patterns using conventional lithography for next-generation high-performance nanosensing, photonic, and computing devices. Here we propose a completely original and novel concept, termed self-shrinking dielectric mask (SDM), to fabricate sub-3 nm patterns. Instead of focusing the electron and ion beams or light to an extreme scale, the SDM method relies on a hard dielectric mask which shrinks the critical dimension of nanopatterns during the ion irradiation. Based on th… Show more

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Cited by 7 publications
(6 citation statements)
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References 41 publications
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“…However, limited by the resolution of the gallium ion beam, beam diameter, beam shape and Micromachines 2022, 13, 923 2 of 18 redeposition, the typical feature size of the hole is always above 10 nm [24]. Furthermore, chemical ways such as ion track etching [25,26], mask etching [27] and chemical solution etching [28,29] were explored to fabricate the solid-state nanopore directly in polymer membrane. Although the smallest diameter was down 2 nm [30], rough hole wall and the specific material requirement limit the widespread use.…”
Section: Introductionmentioning
confidence: 99%
“…However, limited by the resolution of the gallium ion beam, beam diameter, beam shape and Micromachines 2022, 13, 923 2 of 18 redeposition, the typical feature size of the hole is always above 10 nm [24]. Furthermore, chemical ways such as ion track etching [25,26], mask etching [27] and chemical solution etching [28,29] were explored to fabricate the solid-state nanopore directly in polymer membrane. Although the smallest diameter was down 2 nm [30], rough hole wall and the specific material requirement limit the widespread use.…”
Section: Introductionmentioning
confidence: 99%
“…Nanomachines have attracted a lot of attention recently with the rapid development of nanotechnology [ 1 , 2 ] and the urgent requirements in chemical and biological engineering [ 3 , 4 ], especially after the 2016 Nobel Prize in Chemistry was issued to three scientists (i.e., Jean-Pierre Sauvage, Sir J. Fraser Stoddart, and Bernard L. Feringa) who have made brilliant contributions to the field [ 5 ]. The Nano-Electro-Mechanical System (NEMS) [ 6 ] is considered to be one of the important components in nanotechnology, which has the characteristics of quantum effect, interface effect, size effect, and so on.…”
Section: Introductionmentioning
confidence: 99%
“…It consists in irradiating a solid target with a broad ion beam impinging under a well-defined incidence angle θ to the surface normal [9,10]; this erodes material out, surprisingly inducing nanoscale surface ripples, as experimentally found quite early on [11,12]. * jamunoz@math.uc3m.es To date, these nanopatterns have found a large number of applications for, e.g., optoelectronics [13,14], photovoltaics [15], nanolithography [16,17], biomedicine [18,19], or the synthesis of novel structures [20] and materials [21], holding potential for many other [7].…”
Section: Introductionmentioning
confidence: 99%