2020
DOI: 10.1021/acsami.0c13296
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NdCl3 Dose as a Universal Approach for High-Efficiency Perovskite Solar Cells Based on Low-Temperature-Processed SnOx

Abstract: The defects on the surface of low-temperatureprocessed electronic transport layers hindered the development of efficient flexible perovskite solar cells. Herein, we develop a universal NdCl 3 dosing strategy to circumvent the residual Sn(II)−OH defects from the incomplete wet-chemical reaction. The introduction of NdCl 3 does not lead to the doping of Nd 3+ ions but rather the formation of a composite film of NdCl 3 with SnO x . The dose of NdCl 3 effectively reduces surface trap states at low-temperatureproce… Show more

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Cited by 30 publications
(36 citation statements)
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“…The perovskite film deposited on NdCl 3 -IL showed significantly lower photoluminescence intensity than that of control when excited from the ETL side, while almost identical photoluminescences were seen when both films were excited from the perovskite side (see in Figure S14, Supporting Information), which demonstrates more effective carrier extraction at the rear interface in NdCl 3 -IL device. [61][62][63]14] In addition, the NdCl 3 -IL device showed faster photoluminescence decay constants according to the time-resolved photoluminescence (TRPL) spectra excited from the ETL side, demonstrating the better carrier extraction and reduced trap states at the rear interface [6,64] (Figure 6b and Table S5, Supporting Information).…”
Section: Resultsmentioning
confidence: 99%
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“…The perovskite film deposited on NdCl 3 -IL showed significantly lower photoluminescence intensity than that of control when excited from the ETL side, while almost identical photoluminescences were seen when both films were excited from the perovskite side (see in Figure S14, Supporting Information), which demonstrates more effective carrier extraction at the rear interface in NdCl 3 -IL device. [61][62][63]14] In addition, the NdCl 3 -IL device showed faster photoluminescence decay constants according to the time-resolved photoluminescence (TRPL) spectra excited from the ETL side, demonstrating the better carrier extraction and reduced trap states at the rear interface [6,64] (Figure 6b and Table S5, Supporting Information).…”
Section: Resultsmentioning
confidence: 99%
“…Figure a shows the n–i–p‐type planar junction device structure used in this study and the schematic illustration of thermally evaporated NdCl 3 ‐IL on the SnO 2 electron transport layer (ETL) The X‐ray photoelectron spectra (XPS) measurement on the film with NdCl 3 ‐IL showed prominent characteristic peaks of Nd 4d and Cl 2p states at 123.4 and 198.5 eV, demonstrating that the NdCl 3 ‐IL has been successfully evaporated onto the ETL surface [ 6 ] (Figure S1, Supporting Information).…”
Section: Resultsmentioning
confidence: 99%
“…9 Therefore, many alternative n-type wide bandgap semiconductors -such as SnO 2 , ZnO, WO 3 , In 2 O 3 , Zn 2 SnO 4 , SrTiO 3 , BaSnO 3 , Ba 0.8 Sr 0.2 SnO 3 and Nb 2 O 5 -have been studied as ETLs for the realization of high-performance, planar, and low-temperature-processed n-i-p PSCs. [10][11][12] SnO 2 has been identified as one of the most promising candidates owing to its favourable optoelectronic properties, 13,14 including low light absorption, appropriate energy level alignment with the perovskite, high electron mobility as well as low-temperature processing. [13][14][15][16][17][18] However, planar PSCs employing 'standard' SnO 2 ETLswithout any additive or interface modification -often suffer from considerable current-voltage (J-V) hysteresis that limits the PCE of such devices.…”
Section: Introductionmentioning
confidence: 99%
“…However, charge accumulation may happen at the SnO 2 /perovskite interface resulting in severe hysteresis due to much lower electron mobility of SnO 2 ETL than perovskite absorbers (0.5–30 cm 2 V −1 s −1 ) [ 19 22 ]. To alleviate the hysteresis effect, dopants or additives such as metal cations and polymers were added to enhance the conductivity of SnO 2 and hence the PCE of devices.…”
Section: Introductionmentioning
confidence: 99%