2017
DOI: 10.1016/j.apsusc.2017.05.009
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Naturally formed ultrathin V2O5 heteroepitaxial layer on VO2/sapphire(001) film

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Cited by 17 publications
(15 citation statements)
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“…Argon gas was selected as carrier gas during the reduction process of pentavalent vanadium oxides at 600 °C in the reaction furnace. Annealing conditions (e.g., temperature and gas pressure) are of vital importance to the compositions and lattice structure of vanadium oxides . The varied oxygen partial pressures (PO2) were used to explore the formation and the lattice of VO 2 nanostructure thin films .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Argon gas was selected as carrier gas during the reduction process of pentavalent vanadium oxides at 600 °C in the reaction furnace. Annealing conditions (e.g., temperature and gas pressure) are of vital importance to the compositions and lattice structure of vanadium oxides . The varied oxygen partial pressures (PO2) were used to explore the formation and the lattice of VO 2 nanostructure thin films .…”
Section: Resultsmentioning
confidence: 99%
“…Annealing conditions (e.g., temperature and gas pressure) are of vital importance to the compositions and lattice structure of vanadium oxides. [20] The varied oxygen partial pressures (P O 2 ) were used to explore the formation and the lattice of VO 2 nanostructure thin films. [21,22] Here, we annealed the as-prepared thin films by varying the gas pressure from 7.4 to 1.9 Torr.…”
Section: Doi: 101002/pssb201900785mentioning
confidence: 99%
“…Microwave-assisted heating has also been used to produce nanostructured VO 2 via solvothermal synthesis [41,42]. Radio frequency (RF) sputtering [43], metal-organic chemical vapor deposition (MOCVD) [44], and PLD [32] methodologies have also been implemented to achieve nanometer-thick films. However, there are still many opportunities for the development of thin film and nanocrystalline microwave-assisted VO 2 syntheses to decrease the overall cost.…”
Section: Applications and Contemporary Synthesis Methodsmentioning
confidence: 99%
“…Different peak positions can be attributed to the different phases of VOx. [38][39][40][41][42][43][44] The Raman peaks at ~ 275 cm -1 and ~520 cm -1 can be assigned to the A1g vibration modes of the high temperature metallic phase of a V2O3 thin film, while the peak at ~330 cm -1 is the phonon mode of Eg. 38 The broad peak at 443 cm -1 is related to magnon scattering in the anti-ferromagnetic phase of V2O3 thin film.…”
Section: Microstructure Of the Vox Coatingsmentioning
confidence: 99%
“…39 The peaks located at ~ 138 cm -1 , 700 cm -1 , and ~1020 cm -1 agree with the accepted peak position for a V2O5 film. [40][41][42] For the VO2 films, the Raman vibrational modes are commonly located at ~158 cm -1 , 275 cm -1 , 445 cm -1 and ~520 cm -1 . 43, 44 Based on previous publications and the coating parameters used in this work, it is reasonable to conclude that the VOx films coated on glass substrates consisted of various phases of vanadium oxide.…”
Section: Microstructure Of the Vox Coatingsmentioning
confidence: 99%