Nanostructured plasma etched, magnetron sputtered nanolaminar Cr2AlC MAX phase thin films

Grieseler, Rolf; Hähnlein, Bernd; Stubenrauch, Mike; Kups, Thomas; Wilke, Marcus; Hopfeld, Marcus; Pezoldt, Jörg; Schaaf, Peter

doi:10.1016/j.apsusc.2013.12.099

Cited by 38 publications

(33 citation statements)

References 28 publications

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“…In the measured range (10 • -70 • ) there are two super lattice reflections: (002) and (101), which correspond to ordered Cr 2 AlC MAX phase [32,41]. At approximately 13.3 • , (002) weak reflection for all coatings was observed, identifying the presence of the MAX phase within the coating [32]. The (101) reflection cannot be clearly recognized, probably due to the coincidence with the (100) reflection [41].…”

Section: Phase Identificationmentioning

confidence: 99%

“…Cr 2 AlC films can be produced either by sputtering from elemental targets [30][31][32] or compound targets [10,33]. Literature indicates advantages of lower deposition temperatures for Cr 2 AlC [33] in contrast to other MAX phase coatings, like Ti 2 AlC and Ti 3 AlC 2 [34], which is promising for deposition on heat-sensitive substrates, such as steel.…”

Section: Introductionmentioning

confidence: 99%

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Sputtering Power Effects on Growth and Mechanical Properties of Cr2AlC MAX Phase Coatings

Naveed

Obrosov

Żak

et al. 2016

Metals

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Abstract:Coating growth and mechanical properties of nanolamellar Cr 2 AlC coatings at various sputtering power were investigated in the present study. Cr 2 AlC coating was deposited on the IN 718 superalloy and (100) Si wafers by DC magnetron sputtering at different sputtering powers. The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and nanoindentation. It was found that coatings had columnar structure with nanocrystalline substructure. Deposition rate increased with the sputtering power. XRD results showed the presence of the Cr 2 AlC MAX phase, intermetallic AlCr 2 and Cr 7 C 3 carbide phases, along with the change in preferential coating growth orientation. TEM observations confirmed the occurrence of these phases, and the SAED patterns demonstrated significant texture of the coatings. Hardness values were measured in the range between 11-14 GPa, showing a slight increase with the sputtering power.

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Section: Phase Identificationmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Sputtering Power Effects on Growth and Mechanical Properties of Cr2AlC MAX Phase Coatings

Naveed

Obrosov

Żak

et al. 2016

Metals

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“…Numerous other MAX phase materials have been deposited using magnetron sputtering [7][8][9][10][11][12][13][14] including Cr 2 AlC [15][16][17][18][19][20][21][22][23].…”

Section: Introductionmentioning

confidence: 99%

A combinatorial comparison of DC and high power impulse magnetron sputtered Cr2AlC

Field

Carlsson

Eklund

et al. 2014

Surface and Coatings Technology

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Abstract. Using a combinatorial approach, Cr, Al and C have been deposited onto sapphire wafer substrates by High Power Impulse Magnetron Sputtering (HiPIMS) and DC magnetron sputtering. X-ray photoelectron spectroscopy, X-ray absorption spectroscopy and X-ray diffraction were employed to determine the composition and microstructure of the coatings and confirm the presence of the Cr 2 AlC MAX phase within both coatings. One location in both the DCMS and HiPIMS coatings contained only MAX phase Cr 2 AlC.The electrical resistivity was also found to be nearly identical at this location and close to that reported from the bulk, indicating that the additional energy in the HiPIMS plasma was not required to form high quality MAX phase Cr 2 AlC.

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“…elevated temperature [42] and oxidizing atmosphere [43]. It can also be an alternative method of synthesizing the MAX and related phases by annealing amorphous thin films [44][45][46] or artificial multilayers [47][48][49][50][51][52] with an overall chemical composition close to the desired phase.…”

Section: Nanolaminated Transition Metal Carbides From Thin Film Perspmentioning

confidence: 99%

“…Examples can be found in Ref. [47][48][49][50], where artificial carbide-or nitride-nanolaminates were deposited for the synthesis of inherently nanolaminated phases by post-deposition annealing.…”

Section: Inherently Nanolaminated Carbidesmentioning

confidence: 99%

Phase Formation of Nanolaminated Transition Metal Carbide Thin Films

Lai¹

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The cover image is a simple sketch of structural-chemical relation in between the metal layers in nanolaminated transition metal carbides: Mo2GaC, Mo2Ga2C, and Mo2(Au1-xGax)2C with an in-plane order in the Au-Ga layers, where the last two phases were discovered in this thesis. © Chung-Chuan Lai 2017Printed in Sweden by LiU-Tryck 2017 ISSN 0345-7524 ISBN 978-91-7685-526-3 i AbstractResearch on inherently nanolaminated transition metal carbides is inspired by their unique properties combining metals and ceramics, such as higher damage tolerance, better machinability and lower brittleness compared to the binary counterparts, yet retaining the metallic conductivity. The interesting properties are related to their laminated structure, composed of transition-metal carbide layers interleaved by non-transition-metal (carbide) layers. These materials in thin-film form are particularly interesting for potential applications such as protective coatings and electrical contacts. The goal of this work is to explore nanolaminated transition metal carbides from the aspects of phase formation and crystal growth during thin-film synthesis. This was realized by studying phases in select material systems synthesized from two major approaches, namely, from direct-deposition and post-deposition treatment.The first approach was used in studies on the Mo-Ga-C and Zr-Al-C systems. In the former system, intriguing properties have been predicted for the 3D phases and their 2D derivatives (so called MXenes), while in the latter system, the phases are interesting for nuclear applications.In this work, the discovery of a new Mo-based nanolaminated ternary carbide, Mo2Ga2C, is evidenced from thin-film and bulk processes. Its structure was determined using theoretical and experimental techniques, showing that Mo2Ga2C has Ga double-layers in simple hexagonal stacking between adjacent Mo2C layers, and therefore is structurally very similar to Mo2GaC, except for the additional Ga layers. For the Zr-Al-C system, the optimization of phase composition and structure of Zr2Al3C4 in a thin-film deposition process was studied by evaluating the effect of deposition parameters. I concluded that the formation of Zr2Al3C4 is favored with a plasma flux overstoichiometric in Al, and with a minimum lattice-mismatch to the substrates. Consequently, epitaxial Zr2Al3C4 thin film of high quality were deposited on 4H-SiC(001) substrates at 800 °C.With the approach of post-deposition treatment, the studies were focused on a new method of thermally-induced selective substitution reaction of Au for the non-transition-metal layers in nanolaminated carbides. Here, the reaction mechanism has been explored in Al-containing (Ti2AlC and Ti3AlC2) and Ga-containing (Mo2GaC and Mo2Ga2C) phases. The Al and Ga in ii these phases were selectively replaced by Au while the carbide layers remained intact, resulting in the formation of new layered phases, Ti2Au2C, Ti3Au2C2, Mo2AuC, and Mo2(Au1-xGax)2C, respectively. The substitution reaction was explained by fast outward diffus...

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Nanostructured plasma etched, magnetron sputtered nanolaminar Cr2AlC MAX phase thin films

Cited by 38 publications

References 28 publications

Sputtering Power Effects on Growth and Mechanical Properties of Cr2AlC MAX Phase Coatings

Sputtering Power Effects on Growth and Mechanical Properties of Cr2AlC MAX Phase Coatings

A combinatorial comparison of DC and high power impulse magnetron sputtered Cr2AlC

Phase Formation of Nanolaminated Transition Metal Carbide Thin Films

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