2009
DOI: 10.4028/www.scientific.net/kem.416.118
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Abstract: Surface roughness is normally regarded as an important criterion for assessing the quality of optic elements; surface roughness of a high-quality optic element is required to be less than RMS1nm. In this paper, a series of experiments has been conducted on the sample magnetorheological finishing machine by using self-prepared magnetorheological liquid as finishing liquid, to assess the removing efficiency of magnetorheological finishing. Optimization of technological parameters enables the authors to obtain a … Show more

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Cited by 2 publications
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“…The effect of size, concentration and type of abrasive particles as well as the size of magnetic particles on material removal rate and surface roughness of single crystal silicon were also investigated [3][4][5]. Sidpara and Li et al made some nano level finishing for semiconductor materials using magnetorheological finishing process and optimised the values of process parameters [6,7]. Some different mathematical models of material removal in MRF were proposed [8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…The effect of size, concentration and type of abrasive particles as well as the size of magnetic particles on material removal rate and surface roughness of single crystal silicon were also investigated [3][4][5]. Sidpara and Li et al made some nano level finishing for semiconductor materials using magnetorheological finishing process and optimised the values of process parameters [6,7]. Some different mathematical models of material removal in MRF were proposed [8][9][10].…”
Section: Introductionmentioning
confidence: 99%