Nano-lithography with atoms

Bell, A. S.; Brezger, B.; Drodofsky, U.; Nowak, S.; Pfau, Tilman; Stühler, J.; Schulze, Th.; Mlynek, J.

doi:10.1016/s0039-6028(99)00083-7

Cited by 28 publications

(20 citation statements)

References 22 publications

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“…Photolithography, a common technique, uses chemical agents and typically shares about 30% of the manufacturing cost of an integrated circuit [1]. Some dry methods, namely, ion beam, electron beam, and near-field optics technologies [2][3][4][5], have attracted a great deal of interest because of many potential benefits such as the chemical-free manufacturing environment. These processes have a higher resolution; however, they have to be conducted in vacuum, require expensive equipment, and are not adapted to mass production.…”

Section: Introductionmentioning

confidence: 99%

Photonic jet breakthrough for direct laser microetching using nanosecond near-infrared laser

et al. 2014

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Nanosecond near-IR lasers are commonly used for industrial laser processing. In this paper, we demonstrate that a 70 μm diameter beam generated from a 5 W, 28 ns, near-IR (1064 nm) Nd:YAG laser can etch a silicon wafer with a lateral feature size as small as 1.3 μm. Surprisingly with this laser, microetching can also be achieved on glass, despite the low absorption of this material at this wavelength. This breakthrough is carried out in ambient air by using glass microspheres with diameters between 4 and 40 μm that generate a concentrated beam at their vicinity, a phenomenon referred to as a photonic jet. The roles of parameters such as laser fluence, pulse number, microsphere diameter, and distance between the microsphere and the sample are discussed. A good correlation has been observed between the computed photonic jet intensity distribution and the etched marks' geometry.

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Section: Introductionmentioning

confidence: 99%

Photonic jet breakthrough for direct laser microetching using nanosecond near-infrared laser

et al. 2014

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“…An especially promising application of Talbot (or Lau) imaging with atoms is atom lithography as demonstrated in (McClelland et al, 2004;Timp et al, 1992) and many others. For reviews see (Bell et al, 1999;Meschede and Metcalf, 2003). It is possible to write smaller gratings and features using the reduced period intermediate images discussed above.…”

Section: The Talbot Effectmentioning

confidence: 99%

Atom Interferometers

Cronin,

Schmiedmayer,

Pritchard

2007

Preprint

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Interference with atomic and molecular matter waves is a rich branch of atomic physics and quantum optics. It started with atom diffraction from crystal surfaces and the separated oscillatory fields technique used in atomic clocks. Atom interferometry is now reaching maturity as a powerful art with many applications in modern science. In this review we first describe the basic tools for coherent atom optics including diffraction by nanostructures and laser light, three-grating interferometers, and double wells on AtomChips. Then we review scientific advances in a broad range of fields that have resulted from the application of atom interferometers. These are grouped in three categories: (1) fundamental quantum science, (2) precision metrology and (3) atomic and molecular physics. Although some experiments with Bose Einstein condensates are included, the focus of the review is on linear matter wave optics, i.e. phenomena where each single atom interferes with itself.

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“…Recently, atom optics have been used to explore the possibility of lithography with resolutions in the few nm regime [ 2 ]. The observation of Bose-Einstein condensation in atomic traps [ 6 ] has also led to increased recent interest in atom optics, e.g., to study the momentum distribution and coherence of the condensates [ 17 , 28 ].…”

Section: Dna As a Materials For X-ray And Atom Opticsmentioning

confidence: 99%

Diffractive optics from self-assembled DNA

Levine

2002

J. Res. Natl. Inst. Stand. Technol.

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An algorithm is presented for assembling tiles into a variable spaced grating, the one-dimensional analog of a Fresnel zone plate. The algorithm supports multi-level gratings. The x-ray properties of such a grating, assumed to be constructed from DNA are estimated, leading to the conclusion that thick structures may be useful for intermediate energy x rays, but that thin structures for soft x rays are best used as disposable masks. The diffraction of cold, coherent atoms is a plausible application for single layer stencils.

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Nano-lithography with atoms

Cited by 28 publications

References 22 publications

Photonic jet breakthrough for direct laser microetching using nanosecond near-infrared laser

Photonic jet breakthrough for direct laser microetching using nanosecond near-infrared laser

Atom Interferometers

Diffractive optics from self-assembled DNA

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