2014
DOI: 10.2494/photopolymer.27.85
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Moving-mask Lithography for 3D Microstructure Molding

Abstract: Backside lithography with a moving mask UV exposure technique is proposed. A novel moving-mask exposure apparatus was developed and evaluated both experimentally and through exposure simulations. The backside exposure using this technique was validated and is capable of producing tapered microstructures of thick photoresist for molding. The shape of the structure can be modified by the trajectory of the stage movement. It was confirmed that the shape of the processed structure could be successfully predicted u… Show more

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Cited by 2 publications
(2 citation statements)
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“…1 b). Following post-exposure bake, development, rinse, and drying with nitrogen blow, a master mold of the microneedle was obtained 5 , 6 . The shape of the master mold was transferred by poly-dimethyl siloxane (PDMS) (Sylgard 184, Dow Corning Corp, Midland, MI, USA) to be a female mold (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…1 b). Following post-exposure bake, development, rinse, and drying with nitrogen blow, a master mold of the microneedle was obtained 5 , 6 . The shape of the master mold was transferred by poly-dimethyl siloxane (PDMS) (Sylgard 184, Dow Corning Corp, Midland, MI, USA) to be a female mold (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Master male molds of microneedles were fabricated by backside exposure using a previously reported moving-mask lithography system [12]. A custom-made soda lime glass wafer (50 mm in diameter, 170 μm in thickness; Matsunami Glass Ind., Ltd.) was spin-coated with a negative-tone photoresist (SU-8 3050; MicroChem) using a spin-coater (1H-D7; Mikasa Co., Ltd).…”
Section: Fabrication Of Master Male Moldmentioning
confidence: 99%