Morphology, mechanical properties, and oxidation behavior of reactively sputtered Cr–N films

Tu, Jui-Neng; Duh, Jenq‐Gong; Tsai, S. H.

doi:10.1016/s0257-8972(00)00961-0

Cited by 69 publications

(31 citation statements)

References 17 publications

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“…To deposit the hard coating, sputtering is normally used from the available processes because of its high deposition rate, thin compound nature with controlled stoichiometry, simplicity and cost-effectiveness compared to the radio frequency (RF) system. Among the various techniques available for the deposition of CrN thin films, reactive magnetron sputtering could be effectively used to tailor the micro structural features of the films [9][10][11][12][13][14][15][16][17]. For some years, chromium nitride coatings have been gaining popularity and becoming important technological materials in the fields of cutting and forming tools, bearing and machine parts, dies and moulds.…”

Section: Introductionmentioning

confidence: 99%

“…the reactive gas partial pressure and the substrate bias strongly influence the film properties. Tu et al [16] studied the phases of the CrN film identification indicating that at lower nitrogen contents the films exhibit Cr and Cr2N phases (dual phase structure), while the CrN phase is observed in films with nitrogen contents higher than 58 at. %.Z.B.…”

Section: Introductionmentioning

confidence: 99%

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Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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Chromium Nitride (CrN) thin films are known for their comparatively good mechanical properties. CrN was deposited on Silicon (100) and glass substrates by using DC magnetron sputtering and the influence of the partial nitrogen content and different gaseous environment on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM), Atomic Force Microscopy (AFM) and Nanoindentation was used to characterise the structural and mechanical properties of the deposited thin film. The films showed the [200] preferred orientation at lower (at 20%) nitrogen contents while the intensity of the peak [111] increases with the increase in the nitrogen content. The Cr2N (220) peak was identified at a nitrogen content above 30%, but for nitrogen content above 40%, the CrN phase was observed in both films deposited on Si(100) and glass substrates. The preferred orientations of the CrN thin films are strongly influenced by the nitrogen content inside the chamber as observed in the present work. The surface roughness and deposition rate were observed in a reducing trend with the increasing N2 content and temperature from 20.31 to 2.71nm and from 30.16 nm/min to 25.66nm/min, respectively. The hardness and modulus of pure N2 films deposited on the Si substrates were evaluated by nanoindentaion testing and indicated 31 GPa and 250 GPa, respectively.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

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“…Its friction coefficient (in sliding contact with 100Cr6 steel) is comparable to that of TiN, although it can be improved by optimising the growth parameters [8]. Cr-N shows high chemical stability making its use appropriate for hot working applications, as its oxidation temperature is about 700 • C [9]. In addition, its characteristic silver colour has extended its applications towards the decorative sector.…”

Section: Introductionmentioning

confidence: 99%

Recent advances in the chromium nitride PVD process for forming and machining surface protection

Fuentes¹,

Rodríguez²,

Avelar-Batista³

et al. 2005

Journal of Materials Processing Technology

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“…In particular, chromium nitride (CrN) has excellent properties, such as good oxidation resistance and chemical stability. 1,2) CrN-based coatings doped with various metallic elements (e.g. (Cr,Al)N 3,4) and CrSiN 5,6) ) are now being used to improve the properties of the cutting tools.…”

Section: Introductionmentioning

confidence: 99%

Epitaxial Growth of Chromium Oxynitride Thin Films on Magnesium Oxide (100) Substrates and Their Oxidation Behavior

et al. 2013

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Epitaxially grown Cr(N,O) thin films were prepared on MgO substrates, with a misfit of ¹1.7% with respect to CrN, using pulsed laser deposition. X-ray diffraction patterns showed the peak for the (200) reflection of Cr(N,O) around the peak for the (200) reflection of MgO. The X-ray diffraction pattern of the ¤ scan for the (111) reflection of Cr(N,O) showed a narrow peak appearing every 90 degrees. From microstructural observations, grain boundaries in the thin films could not be confirmed. In order to evaluate the oxidation behavior of Cr(N,O) thin films, oxidation tests in air were carried out. After the oxidation tests, a Cr 2 O 3 phase was formed at 873 K and the B1 (NaCl-type) phase disappeared at 1173 K. In the thin film oxidized at 1073 K, a Cr 2 O 3 layer on the surface of the thin film as well as a compositional gradient of oxygen were observed. This indicates that Cr(N,O) hard coatings can form oxidation barrier layers to extend the lifetime of cutting tools.

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Morphology, mechanical properties, and oxidation behavior of reactively sputtered Cr–N films

Cited by 69 publications

References 17 publications

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Recent advances in the chromium nitride PVD process for forming and machining surface protection

Epitaxial Growth of Chromium Oxynitride Thin Films on Magnesium Oxide (100) Substrates and Their Oxidation Behavior

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