2022
DOI: 10.3390/app12042188
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Molecular Dynamics of Atomic Layer Deposition: Sticking Coefficient Investigation

Abstract: This study focused on the atomic scale growth dynamics of amorphous Al2O3 films microscale structural relaxation. Classical Molecular Dynamics (MD) can not entirely model the challenging ALD dynamics due to the large timescales. The all-atom approach has rules based on deposition actions modelled MD relaxations that form as input to attain a single ALD cycle. MD relaxations are used to create a realistic equilibrium surface. This approach is fitting to this study as the investigation of the sticking coefficien… Show more

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Cited by 20 publications
(18 citation statements)
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“…That is 180/p∙K. The idea is to somehow (using one or another heuristic [ 20 , 21 , 22 ]) find the best (optimal) solution in the neighborhood, assign such a material and orientation to this layer, and proceed to the next layer. It is important to remember here that the reference frame of the layers is not from the bottom up (or from the top down) relative to the thickness of the package but from the middle plane, two layers at a time (+φi and −φi).…”
Section: Resultsmentioning
confidence: 99%
“…That is 180/p∙K. The idea is to somehow (using one or another heuristic [ 20 , 21 , 22 ]) find the best (optimal) solution in the neighborhood, assign such a material and orientation to this layer, and proceed to the next layer. It is important to remember here that the reference frame of the layers is not from the bottom up (or from the top down) relative to the thickness of the package but from the middle plane, two layers at a time (+φi and −φi).…”
Section: Resultsmentioning
confidence: 99%
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Section: Regulatory Compliance In Cloud-based Accountingmentioning
confidence: 99%
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Section: Challenges and Considerationsmentioning
confidence: 99%