2016
DOI: 10.1007/s10971-015-3953-4
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Modification of electrical and optical properties of CuO thin films by Ni doping

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Cited by 103 publications
(34 citation statements)
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“…It can be said that all thin film surface is also composed of densely packed nanoparticles and the coverage rate of the nanoparticles comparatively increased with Sb. A similar change in the SEM images was reported in our previous work [40].…”
Section: Surface Morphology Studiessupporting
confidence: 89%
“…It can be said that all thin film surface is also composed of densely packed nanoparticles and the coverage rate of the nanoparticles comparatively increased with Sb. A similar change in the SEM images was reported in our previous work [40].…”
Section: Surface Morphology Studiessupporting
confidence: 89%
“…In order to estimate the bandgap of the CuO thin films, first, the transmittance (T) and reflectance (R) experimental data were converted to the absorption coefficient (α) via the following equation: (4) where t is thickness 3,26 . The optical bandgap (E g ) and absorption coefficient are directly related via the Tauc relation: (5) where hυ is the photon energy, A is an energy independent constant, and n is ½ for direct allowed transition. Therefore, the bandgap can be estimated by plotting (αhν) 2 versus hν and extrapolating the linear part of the Tauc plot to (αhν)…”
Section: Electrical Propertiesmentioning
confidence: 99%
“…CuO with its monoclinic structure naturally exhibits p-type conductivity and the band gap values of 1.3-2.1 eV has been reported in literatures 3 . The possibility of depositing CuO with almost all conventional methods, such as sputtering 4 , sol-gel 5 , chemical vapor deposition 6 , thermal deposition 7 , can provide the groundwork for the deposition of CuO films with a wide variety of characteristics. However, the main drawback of the most sophisticated methods is the fact that they require highly expensive devices and processes.…”
Section: Introductionmentioning
confidence: 99%
“…The microstructural and surface morphological properties of CuO films are determined by their preparation technique. CuO films have been grown using various deposition techniques such as thermal oxidation [20], electrodeposition [21,22], pulsed-laser deposition [23], plasma evaporation [24], thermal evaporation [25], reactive sputtering [26], electron-beam evaporation [27], molecular-beam epitaxy [28], spray pyrolysis [29,30], spin coating [31], successive ionic layer adsorption and reaction (SILAR) [32] and chemical vapor deposition [33,34]. Among these film deposition processes, radio-frequency (RF) magnetron sputtering is one of the most pre-eminent industrial practical techniques to achieve high-quality and uniform thickness films with the required chemical composition [35].…”
Section: Introductionmentioning
confidence: 99%
“…Note that the number of works reporting the supercapacitive properties of CuO films is very limited. We only identified nine articles, which are listed in Table 1 with the brief description of the synthesis procedures [31,[43][44][45][46][47][48][49][50]. All works show multi-step processes (at least three steps) used for the synthesis of CuO films, which are rather complex and costly methods compared with the one-step magnetron sputtering technique, which is also scalable for low-cost industrial production without the use of chemicals in aqueous solutions.…”
Section: Introductionmentioning
confidence: 99%