2016
DOI: 10.1109/tcsi.2016.2622225
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Modeling Valance Change Memristor Device: Oxide Thickness, Material Type, and Temperature Effects

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Cited by 27 publications
(19 citation statements)
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“…The previous results support the existing model that attributes resistive switching in laser-reduced GO to the non-uniformity in the number and location of functional groups that create nanometric-size regions of different conductance [18]. The sp 2 regions present high-conductivity but they are interrupted by low-conductivity sp 3 domains at a nanoscale level that are responsible for a low current flow [30,31]. At certain locations within the structure, under the action of the voltage bias in the HRS, large electrostatic potential gradients are created in the nanometric-size low-conductivity regions, resulting in large localized electric fields.…”
Section: Numerical Analysis Of Charge Conduction and Resistive Swisupporting
confidence: 81%
“…The previous results support the existing model that attributes resistive switching in laser-reduced GO to the non-uniformity in the number and location of functional groups that create nanometric-size regions of different conductance [18]. The sp 2 regions present high-conductivity but they are interrupted by low-conductivity sp 3 domains at a nanoscale level that are responsible for a low current flow [30,31]. At certain locations within the structure, under the action of the voltage bias in the HRS, large electrostatic potential gradients are created in the nanometric-size low-conductivity regions, resulting in large localized electric fields.…”
Section: Numerical Analysis Of Charge Conduction and Resistive Swisupporting
confidence: 81%
“…The other model to explain the resistive switching in GO films proposes that the conductive path is caused by transforming insulating sp 3 domains to conducting sp 2 bonds (oxygen vacancies) based on the detachment of oxygen groups under the action of the electric field [49,52]. Several works based on first principles and statistical calculations [53,54] have demonstrated the tendency of the oxygen functionalities to agglomerate and form highly oxidized domains surrounded by areas of pristine graphene.…”
Section: Discussionmentioning
confidence: 99%
“…It can be observed that the filter with the integrated resistive gap can have ideal behavior if the gap size is ≥ 200 µm. However, it is challenging to operate a RRAM device with such gap (the distance between the two electrodes) size as the generated electric field will not be sufficient to switch the state of the device, taking into account the planar structure of the device 41 44 . The gap of RRAM devices reported in the literature ranges from nm to submicrons 39 .…”
Section: Resultsmentioning
confidence: 99%