2010
DOI: 10.1364/oe.18.015523
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Mid-infrared characterization of solution-processed As_2S_3 chalcogenide glass waveguides

Abstract: An etch-free and cost-effective deposition and patterning method to fabricate mid-infrared chalcogenide glass waveguides for chemical sensing applications is introduced. As(2)S(3) raised strip optical waveguides are produced by casting a liquid solution of As(2)S(3) glass in capillary channel molds formed by soft lithography. Mid-IR transmission is characterized by coupling the output of a quantum cascade (QC) laser (lambda = 4.8 microm) into the 40 microm wide by 10 microm thick multi-mode waveguides. Loss as… Show more

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Cited by 70 publications
(64 citation statements)
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“…Although the SOI waveguides are relatively large we believe that sub dB/cm losses can be achieved by using even smaller structures such as for example LOCOS waveguides [26]. The propagation loss demonstrated here is also much lower than losses previously reported in the literature for other MIR waveguides [14,27,28].…”
Section: Resultsmentioning
confidence: 53%
“…Although the SOI waveguides are relatively large we believe that sub dB/cm losses can be achieved by using even smaller structures such as for example LOCOS waveguides [26]. The propagation loss demonstrated here is also much lower than losses previously reported in the literature for other MIR waveguides [14,27,28].…”
Section: Resultsmentioning
confidence: 53%
“…In addition to their exceptional optical properties, ChG's are also uniquely poised for mid-IR multimaterial photonic integration. These glasses can be deposited at high rates exceeding 100 nm/min via simple single-source thermal evaporation with the substrate held near room temperature [41] or via simple solution processing [42][43][44][45]. Combined with their amorphous nature, good van der Waals adhesion to different substrates without surface modification [46], and ease of processing [47], the extremely low thermal budget allows epitaxy-free ChG coating to form optically thick films on different substrates including silicon and III-V semiconductors, the dominant substrate platform for most mid-IR photonic devices.…”
Section: Integrated Photonics For Infrared Spectroscopic Sensingmentioning
confidence: 99%
“…PML is an artificial ideally absorbing layer which is used to shorten computational regions in numerical method simulation with open boundaries. To perform the FDTD simulation in a finite volume of space, the computational cell Inter Chip Distance (µm) 10 terminates with user defined boundary conditions. The computational cell is further subdivided into convex rectilinear regions.…”
Section: Fdtd Modelling Using Meepmentioning
confidence: 99%