In situ photoelastic-modulated Fourier transform infrared reflection absorption spectroscopy has been applied for the investigation of interfacial stability of organothiol and organosilane monolayer films on nanocrystalline zinc oxide thin films. It has been shown that for octadecyltriethoxysilane films, exposure to high water activities results in physisorption of water in the crosslinked film. This high water activity at the interface leads to a reversible wet de-adhesion of the interfacial silanol groups from the ZnO surface. However, the organothiol seems to form a denser monolayer and a stable by S-Zn bond that is resistant to the competition with adsorbed water. The reversible attachment for cross-linked organosilanol films has been demonstrated for the first time by means of an in situ spectroscopic method on model ZnO surfaces. Copyright © 2016 John Wiley & Sons, Ltd.Keywords: interfacial stability; photoelastic-modulated Fourier transform infrared reflection absorption spectroscopy (PM-IRRAS); organofunctional monolayer films; zinc oxide; organosilane Thin organic films play an important role in microsensors, electronics and optical devices and offer wide possibilities in tuning surface and interface properties for the development of protective coatings and biocompatible materials. [1][2][3][4][5][6][7] Organosilanols are a class of functional molecules that are able to react with organic and inorganic surfaces through surface hydroxyl groups to form an interface dominated by van der Waals and hydrogen bonding interactions that could be converted to covalent bonds via hydrolysis reactions, usually achieved by means of a thermal treatment. [1,8,9] Even though the exact mechanism of the film formation is still not fully understood, the consensus in the literature points to a stepwise evolution of the cross-linked siloxane network via the hydrolysis of halogen or alkoxy groups to silanols in contact with water, which can then further react to form the Si-O-Si and Si-O metal bonds. [10,11] While the Si-O-Si bond formation can be easily proven, the covalent bond formation to metal and oxide-covered metal substrates especially in the presence of water is questionable.In a recent study, Naik and coworkers have investigated the effect of the degree of polymerization on the film formation of alkylsilane monolayers on silica surfaces and have concluded that the inherent stress caused by the mismatch of alkyl-chain van der Waals radius and Si-O-Si bond distance results in the adsorption of structures resembling snow moguls or closely packed umbrellas.[11] Organothiols and organophosphonic acids, which can form stable interfaces on zinc oxide surfaces, have been investigated as adhesion promoters on various metal-metal oxide surfaces, as insulating layers on circuit materials, as well as possible linkers for sensor and biosensor applications. [4,5,7,12,13] In most of the aforementioned application fields, the stability of the thin functional films is strongly dependent on the strength of the interfacial interactions...