2006
DOI: 10.1016/j.ijms.2005.11.010
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Microplasmas, an emerging field of low-temperature plasma science and technology

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Cited by 266 publications
(190 citation statements)
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“…Helium and argon metastables can be excluded since they are subject to very fast two-step destruction processes via excited dimers at high pressures [15]. During this process radiation in the VUV is emitted (e.g.…”
Section: Oes In the Uv And Vuvmentioning
confidence: 99%
“…Helium and argon metastables can be excluded since they are subject to very fast two-step destruction processes via excited dimers at high pressures [15]. During this process radiation in the VUV is emitted (e.g.…”
Section: Oes In the Uv And Vuvmentioning
confidence: 99%
“…Plasmas are highly excited gases, containing reactive species including ions, radicals, electrons, and radiation. 66 These reactive species may be used for surface etching or, alternatively, deposition of various surface layers. [67][68][69][70] While plasma chemistry can be very complex, due to the many different species present, there are significant practical advantages.…”
Section: Microplasmasmentioning
confidence: 99%
“…Details on the characteristics of microplasma sources, their designs, modes of operation and potential applications have been discussed in the following review articles [1,[5][6][7][8]. Non-thermal microplasmas are rich sources of reactive ions, metastables, radicals and photons, and are particularly useful for the surface treatment of heat-sensitive materials such as polymers without altering the beneficial bulk properties of the material such as structural integrity or flexibility [9,10].…”
Section: Introductionmentioning
confidence: 99%