2008
DOI: 10.1016/j.tsf.2007.12.117
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Micro and nano-structuration of silicon by femtosecond laser: Application to silicon photovoltaic cells fabrication

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Cited by 194 publications
(100 citation statements)
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“…Different methods for fabricating b-Si have been introduced, such as laser texturization 20 , plasma immersion ion implantation 14 or metal-assisted wet etching 21 . Here, we use cryogenic deep reactive ion etching (DRIE) as it has multiple advantages: it is fast and inexpensive, there is no dependence on crystalline orientation, and there is no requirement for mask layers 22 .…”
Section: Reflectance and Surface Recombinationmentioning
confidence: 99%
“…Different methods for fabricating b-Si have been introduced, such as laser texturization 20 , plasma immersion ion implantation 14 or metal-assisted wet etching 21 . Here, we use cryogenic deep reactive ion etching (DRIE) as it has multiple advantages: it is fast and inexpensive, there is no dependence on crystalline orientation, and there is no requirement for mask layers 22 .…”
Section: Reflectance and Surface Recombinationmentioning
confidence: 99%
“…applications. Perhaps the most well-known application of such a functionalized surface is the production of black silicon, which exhibits wide-band optical absorption for increased solar cell efficiency [1][2][3][4][5][6][7][8][9][10]. Additionally, the modification of wettability from superhydrophilic [11,12] to superhydrophobic [13][14][15][16] is utilized for self-cleaning surfaces, drag reduction, and anticorrosive surfaces, among others.…”
Section: Introductionmentioning
confidence: 99%
“…Halbwax et al [72] produced slightly different geometries of such micro structures on ntype silicon doped phosphorus. This was done by varying processing parameters in vacuum.…”
Section: Topographic Surface Modificationsmentioning
confidence: 99%