2006
DOI: 10.1016/j.nimb.2005.08.078
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MeV ion beam deformation of colloidal silica particles

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Cited by 20 publications
(15 citation statements)
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“…Afterwards the samples were cut into several pieces to be irradiated at room temperature with 8 and 10 MeV Si ions at an angle of 45°with respect to the sample surface. The Si ion fluences ranged from 1.5 Â 10 15 to 1 Â 10 16 Si/cm 2 , and were chosen according to our previous results concerning the ion beam-induced deformation of silica particles [16]. Ion implantation and RBS analysis were performed using our 3 MV Tandem accelerator (NEC 9SDH-2 Pelletron).…”
Section: Methodsmentioning
confidence: 99%
“…Afterwards the samples were cut into several pieces to be irradiated at room temperature with 8 and 10 MeV Si ions at an angle of 45°with respect to the sample surface. The Si ion fluences ranged from 1.5 Â 10 15 to 1 Â 10 16 Si/cm 2 , and were chosen according to our previous results concerning the ion beam-induced deformation of silica particles [16]. Ion implantation and RBS analysis were performed using our 3 MV Tandem accelerator (NEC 9SDH-2 Pelletron).…”
Section: Methodsmentioning
confidence: 99%
“…This ion-beam induced anisotropic deformation of amorphous materials such as silica has been observed in the case of SiO 2 films on Si substrates [3] as well as in colloidal silica particles [4,5]. In both cases the resulting effect is an increase of the sample dimensions perpendicular to the ion beam and a decrease in the direction parallel to the ion beam as a function of the fluence [5,6]. This effect has been observed in several classes of amorphous materials, but never in crystalline samples.…”
Section: Introductionmentioning
confidence: 61%
“…Indeed, it has been observed that amorphous glassy materials like silicon dioxide [3,4] can undergo extreme deformations under exposure to high-energy beams. This ion-beam induced anisotropic deformation of amorphous materials such as silica has been observed in the case of SiO 2 films on Si substrates [3] as well as in colloidal silica particles [4,5]. In both cases the resulting effect is an increase of the sample dimensions perpendicular to the ion beam and a decrease in the direction parallel to the ion beam as a function of the fluence [5,6].…”
Section: Introductionmentioning
confidence: 67%
“…[11][12][13][14] The electronic energy loss of the incoming MeV ions causes an anisotropic deformation consisting of an increase in the sample dimensions perpendicular to the ion beam and a decrease in the dimension parallel to the ion beam. 15 Induced strains accumulate with increasing ion beam fluence and can exceed unity, causing microns of dimensional changes.…”
Section: 4-6mentioning
confidence: 99%