Metal diffusion and chemical processes of mono and bi-layer thin films

Abstract

Cover: Delta value for the full spectral range obtained from in situ measurement of tin deposition on silicon wafer. Picture shows data obtained at 1 minute intervals during deposition. Nederlandse titel: Metaal diffusie en chemische oppervlakte processen van mono en bi-laag dunne films This dissertation has been approved by: Supervisor: prof.dr. F. Bijkerk ISBN: 978-90-365-4568-6 ©Małgorzata Pachecka (2018) T This thesis is based on the following publications: Chapter 2: Pachecka, M.; Sturm, J. M.; van de Kruijs, R. W. E.; Lee, C. J.; Bijkerk, F., Electronegativity-Dependent Tin Etching from Thin Films. AIP Adv. 2016, 6, 075222. Chapter 3: Pachecka, M.; Lee, C. J.; Sturm, J. M.; Bijkerk, F., Tin Etching from Metallic and Oxidized Scandium Thin Films. AIP Adv. 2017, 7, 085107. Chapter 4: Pachecka, M.; Lee, C. J.; Sturm, J. M.; Bijkerk, F., Metal Diffusion Properties of Ultra-Thin High-k Sc2O3 Films. AIP Adv. 2017, 7, 105324. Chapter 5: Pachecka, M.; Sturm, J. M.; Lee, C. J.; Bijkerk, F., Adsorption and Dissociation of CO2 on Ru(0001).