We investigated the masking effect, that is, the dissolution inhibition effect, of photoactive compounds (PAC) with various ballast moelcules in novolak‐naphthoquinonediazide positive photoresists. Two types of ballast molecules were examined: hydroxybenzophenones (HBP) and several m‐cresol novolak resins (MCN) of different molecular lengths. The number of naphthoquinonediazide sulfonic (NQDS) moieties in the resist film and the average esterification value of the PACs were the same for each type of …
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