Macromol. Chem. Phys. 3–4/2009

Retsch, Markus; Zhou, Zheng; Rivera, Sergio; Kappl, Michael; Xin, Zhao; Jonas, Ulrich; Li, Qin

doi:10.1002/macp.200990002

Cited by 45 publications

(77 citation statements)

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“…[55] It has been shown that monolayers, which were floated in the presence of surfactants, exhibited a higher mechanical stability and fractured less easily at the edges. [55] This higher stability facilitates the transfer to solid substrates as well. Additionally, free surfactant molecules can adsorb to the particle surfaces and introduce further negative charges.…”

Section: Resultsmentioning

confidence: 99%

“…[55,93] Vortical deposition high/medium easy, fast arbitrary substrates [89] Direct assembly high/high easy, fast arbitrary substrates [94] , in this thesis 32 Theory…”

Section: Summary Of the Crystallization Methodsmentioning

confidence: 99%

“…Additionally, as the particle concentration of the dispersion changes in the course of the process, accurate coverage of arbitrary large areas is impeded. [55] Figure 3.3.2. Schematic illustration of the controlled vertical deposition process.…”

Section: Vertical and Horizontal Deposition (Convective Assembly)mentioning

confidence: 99%

“…[55] In this two-step procedure, a glass slide is covered with sparsely distributed colloids prepared by a simple spincoating step. This slide is subsequently immersed into water containing a small amount of sodium dodecyl sulfate (SDS) molecules.…”

Section: Crystallization On a Langmuir Troughmentioning

confidence: 99%

“…meniscus pinning and changes in local concentration during the process lead to irregularities during the crystallization. [48,55] Up to now, precise control over both mentioned features is challenging.…”

mentioning

confidence: 99%

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Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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This thesis focuses on the controlled assembly of monodisperse polymer colloids into ordered two-dimensional arrangements. These assemblies, commonly referred to as colloidal monolayers, are subsequently used as masks for the generation of arrays of complex metal nanostructures on solid substrates.The motivation of the research presented here is twofold. First, monolayer crystallization methods were developed to simplify the assembly of colloids and to produce more complex arrangements of colloids in a precise way. Second, various approaches to colloidal lithography are designed with the aim to include novel features or functions to arrays of metal nanostructures.The air/water interface was exploited for the crystallization of colloidal monolayer architectures as it combines a two-dimensional confinement with a high lateral mobility of the colloids that is beneficial for the creation of high long range order. A direct assembly of colloids is presented that provides a cheap, fast and conceptually simple methodology for the preparation of ordered colloidal monolayers. The produced two-dimensional crystals can be transformed into nonclose-packed architectures by a plasma-induced size reduction step, thus providing valuable masks for more sophisticated lithographic processes. Finally, the controlled co-assembly of binary colloidal crystals with defined stoichiometries on a Langmuir trough is introduced and characterized with respect to accessible configurations and size ratios.Several approaches to lithography are presented that aim at introducing different features to colloidal lithography. First, using metal-complex containing latex particles, the synthesis of which is described as well, symmetric arrays of metal nanoparticles can be created by controlled combustion of the organic material of the colloids. The process does not feature an inherent limit in nanoparticle size and is able to produce complex materials as will be demonstrated for FePt alloy particles. Precise control over both size and spacing of the particle array is presented.Second, two lithographic processes are introduced to create sophisticated nanoparticle dimer units consisting of two crescent shaped nanostructures in close proximity; essentially by using a single colloid as mask to generate two structures simultaneously. Strong coupling processes of the parental plasmon resonances of the two objects are observed that are accompanied by high near-field enhancements. A plasmon hybridization model is elaborated to explain all polarization dependent shifts of the resonance positions. Last, a technique to produce laterally patterned, ultra-flat substrates without surface topographies by embedding gold nanoparticles in a silicon dioxide matrix is applied to construct robust and re-usable sensing architectures and to introduce an approach for the nanoscale patterning of solid supported lipid bilayer membranes.

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Section: Resultsmentioning

confidence: 99%

“…[55,93] Vortical deposition high/medium easy, fast arbitrary substrates [89] Direct assembly high/high easy, fast arbitrary substrates [94] , in this thesis 32 Theory…”

Section: Summary Of the Crystallization Methodsmentioning

confidence: 99%

Section: Vertical and Horizontal Deposition (Convective Assembly)mentioning

confidence: 99%

Section: Crystallization On a Langmuir Troughmentioning

confidence: 99%

mentioning

confidence: 99%

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Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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Wafer‐Scale Fabrication of Ordered Binary Colloidal Monolayers with Adjustable Stoichiometries

Vogel¹,

Viguerie²,

Jonas³

et al. 2011

Adv Funct Materials

Self Cite

172

216

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Colloidal monolayers with high order and increased complexity beyond plain hexagonal packing geometries are useful for 2D templating of surface nanostructures and lithographic applications. Here, binary colloidal monolayers featuring a close‐packed monolayer of large spheres (L) with a superlattice of small particles (S) are prepared in a single step using a Langmuir trough. Adjustment of the stoichiometry of the two particle types at the air–water interface leads to a high degree of control over the occupation of the interstitial sites in the close‐packed layer of large spheres by the small colloids. Thus, large areas of binary 2D crystals with LS2, LS6, and LS9 structures are fabricated in a controlled way. The process allows the formation of binary crystals over a wide range of particle size ratios from 0.19 to 0.40. The pH value of the subphase can be used to enhance the crystallization process by changing the contact angle of the particles at the interface. An interfacial polymerization of butyl cyanoacrylate is used to directly image the contact angle of the colloids at the interface. Transfer to solid substrates is achieved by a surface lowering technique. A variety of substrates with arbitrary topographies can thus be decorated with colloidal monolayers. Applied to a lithographic process, such monolayer architectures allow the generation of complex patterns, not accessible with conventional close‐packed monolayers.

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Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

et al. 2022

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Transparent conductive films (TCFs) are irreplaceable components in most optoelectronic applications such as solar cells, organic light‐emitting diodes, sensors, smart windows, and bioelectronics. The shortcomings of existing traditional transparent conductors demand the development of new material systems that are both transparent and electrically conductive, with variable functionality to meet the requirements of new generation optoelectronic devices. In this respect, TCFs with periodic or irregular nanomesh structures have recently emerged as promising candidates, which possess superior mechanical properties in comparison with conventional metal oxide TCFs. Among the methods for nanomesh TCFs fabrication, nanosphere lithography (NSL) has proven to be a versatile platform, with which a wide range of morphologically distinct nanomesh TCFs have been demonstrated. These materials are not only functionally diverse, but also have advantages in terms of device compatibility. This review provides a comprehensive description of the NSL process and its most relevant derivatives to fabricate nanomesh TCFs. The structure‐property relationships of these materials are elaborated and an overview of their application in different technologies across disciplines related to optoelectronics is given. It is concluded with a perspective on current shortcomings and future directions to further advance the field.

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Macromol. Chem. Phys. 3–4/2009

Cited by 45 publications

References 0 publications

Surface Patterning with Colloidal Monolayers

Surface Patterning with Colloidal Monolayers

Wafer‐Scale Fabrication of Ordered Binary Colloidal Monolayers with Adjustable Stoichiometries

Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

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