Low temperature XPS studies of NO and N2O adsorption on Al(100)

Pashutski, A.; Folman, M.

doi:10.1016/0039-6028(89)90383-x

Cited by 83 publications

(38 citation statements)

References 18 publications

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“…1(a), all samples show the N 1s peak at 397.0 eV except the sample without NH 3 plasma pretreatment, corresponding to the N Ge bonding [20]. The N H and N O bonding has a higher binding energy at 398.8 eV [21] and 402.9 eV [22], respectively. This indicates the NH 3 plasma can react with Ge surface to form N Ge bonding.…”

Section: Resultsmentioning

confidence: 94%

HfO2/GeO N /Ge gate stacks with sub-nanometer capacitance equivalent thickness and low interface trap density by in situ NH3 plasma pretreatment

Cao

Liu

et al. 2015

Applied Surface Science

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Section: Resultsmentioning

confidence: 94%

HfO2/GeO N /Ge gate stacks with sub-nanometer capacitance equivalent thickness and low interface trap density by in situ NH3 plasma pretreatment

Cao

Liu

et al. 2015

Applied Surface Science

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“…If we consider the direct reduction of Co(NO 3 ) 2 to Co, then we can assign this new species to N 2 O, which is in agreement with the data of Pashutski and Folman. 34 However, according to the same authors, N 2 O can only be observed by XPS on such a metal surface at 80 K. We would then rather assign it to the NO − 2 ion. 35 We claim here that cobalt nitrite is a reaction intermediate, as it could only be stabilised by a counter ion such as K or Na.…”

Section: A Reduction Of Cobalt Nitratementioning

confidence: 97%

Closing the pressure gap in x-ray photoelectron spectroscopy by membrane hydrogenation

Delmelle

Probst

Alberto

et al. 2015

Review of Scientific Instruments

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Comprehensive studies of gas-solid reactions require the in-situ interaction of the gas at a pressure beyond the operating pressure of ultrahigh vacuum (UHV) X-ray photoelectron spectroscopy (XPS). The recent progress of near ambient pressure XPS allows to dose gases to the sample up to a pressure of 20 mbar. The present work describes an alternative to this experimental challenge, with a focus on H2 as the interacting gas. Instead of exposing the sample under investigation to gaseous hydrogen, the sample is in contact with a hydrogen permeation membrane, through which hydrogen is transported from the outside to the sample as atomic hydrogen. Thereby, we can reach local hydrogen concentrations at the sample inside an UHV chamber, which is equipped with surface science tools, and this corresponds to a hydrogen pressure up to 1 bar without affecting the sensitivity or energy resolution of the spectrometer. This experimental approach is validated by two examples, that is, the reduction of a catalyst precursor for CO2 hydrogenation and the hydrogenation of a water reduction catalyst for photocatalytic H2 production, but it opens the possibility of the new in situ characterisation of energy materials and catalysts. 86, 053104 (2015) Closing the pressure gap in x-ray photoelectron spectroscopy by membrane hydrogenation Comprehensive studies of gas-solid reactions require the in-situ interaction of the gas at a pressure beyond the operating pressure of ultrahigh vacuum (UHV) X-ray photoelectron spectroscopy (XPS). The recent progress of near ambient pressure XPS allows to dose gases to the sample up to a pressure of 20 mbar. The present work describes an alternative to this experimental challenge, with a focus on H 2 as the interacting gas. Instead of exposing the sample under investigation to gaseous hydrogen, the sample is in contact with a hydrogen permeation membrane, through which hydrogen is transported from the outside to the sample as atomic hydrogen. Thereby, we can reach local hydrogen concentrations at the sample inside an UHV chamber, which is equipped with surface science tools, and this corresponds to a hydrogen pressure up to 1 bar without affecting the sensitivity or energy resolution of the spectrometer. This experimental approach is validated by two examples, that is, the reduction of a catalyst precursor for CO 2 hydrogenation and the hydrogenation of a water reduction catalyst for photocatalytic H 2 production, but it opens the possibility of the new in situ characterisation of energy materials and catalysts. C 2015 AIP Publishing LLC. REVIEW OF SCIENTIFIC INSTRUMENTS[http://dx

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“…4c). Appearance of high O1s binding energies was also observed by Pashutksi et al [44] There are two low intense peaks located at 531 and 533 eV. The different O1s peaks could arise because of the presence of oxygen with different ionization states.…”

Section: Photoelectron Spectroscopy Studiesmentioning

confidence: 52%

Free‐standing and flexible nano‐ZnO/PVDF composite thin films: impedance spectroscopic studies

Bhunia

Ghosh

et al. 2015

Polymers for Advanced Techs

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Nanocrystalline ZnO-impregnated polyvinylidene fluoride (nano-ZnO/PVDF) composite films were prepared by sol-gel technique. Free-standing and flexible films with different nano-ZnO loadings were synthesized. Addition of ZnO in PVDF host matrix modulated the impedance and dielectric properties. The composite films thus obtained were characterized by microstructural, XPS, and impedance spectroscopic measurements.

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Low temperature XPS studies of NO and N2O adsorption on Al(100)

Cited by 83 publications

References 18 publications

HfO2/GeO N /Ge gate stacks with sub-nanometer capacitance equivalent thickness and low interface trap density by in situ NH3 plasma pretreatment

HfO2/GeO N /Ge gate stacks with sub-nanometer capacitance equivalent thickness and low interface trap density by in situ NH3 plasma pretreatment

Closing the pressure gap in x-ray photoelectron spectroscopy by membrane hydrogenation

Free‐standing and flexible nano‐ZnO/PVDF composite thin films: impedance spectroscopic studies

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