“…The possibility of improving the PCE after controlling the doping density projected NiO as one of the forthcoming worthwhile HTL candidates. Therefore, various growth mechanisms and thin-film technologies have been explored for its synthesis or/and coating of NiO films in the ambient atmosphere, such as sputtering, 373 atomic layer deposition (ALD), 374 solvothermal growth, 375 sol–gel, 376 e-beam evaporation, 377 reactive e-beam evaporation, 378 atmospheric pressure spatial atomic layer deposition (AP-SALD), 379 and thermal evaporation followed by oxidation. 380 Among them, repeated spin coating has been observed to be a simple and cost-effective method to gain precise control over the thickness and crystallinity of NiO nanostructures, although the residual ligands reduce the coverage of the perovskite absorber, and hence the performance of PSCs.…”