1986
DOI: 10.1143/jjap.25.l868
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Low-Temperature Growth of GaAs and AlAs-GaAs Quantum-Well Layers by Modified Molecular Beam Epitaxy

Abstract: When Ga or Al atoms are evaporated on a clean GaAs surface in an As-free atmosphere, they are quite mobile and migrate very rapidly along the surface even at low temperatures. This characteristic are utilized for growing high-quality GaAs and AlAs layers at very low temperatures by alternately supplying Ga or Al atoms and As4 molecules to the GaAs substrate. Applying this method, GaAs layers and AlAs–GaAs quantum well structures with reasonable photoluminescence characteristics are grown at 200°C and 300°C, re… Show more

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Cited by 387 publications
(60 citation statements)
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“…Recently CA-ordering has been demonstrated in CuInSe2 in both copper and indium-rich materials grown by Migration-Enhanced Epitaxy (MEE) [60] using XRD, TEM, and Raman scattering detection techniques [61]. Further studies of the electronic and optical properties of CA-CIS are needed to assess their impact on PV device absorber materials, which very likely contain nanoscale domains of this crystallographic polytype.…”
Section: Metastable Crystallographic Structures -Cuau-orderingmentioning
confidence: 99%
See 1 more Smart Citation
“…Recently CA-ordering has been demonstrated in CuInSe2 in both copper and indium-rich materials grown by Migration-Enhanced Epitaxy (MEE) [60] using XRD, TEM, and Raman scattering detection techniques [61]. Further studies of the electronic and optical properties of CA-CIS are needed to assess their impact on PV device absorber materials, which very likely contain nanoscale domains of this crystallographic polytype.…”
Section: Metastable Crystallographic Structures -Cuau-orderingmentioning
confidence: 99%
“…The Migration Enhanced Epitaxy (MEE) process variant [60] of molecular beam epitaxy was utilized to grow CIS epilayers on single-crystal substrates.…”
Section: Epitaxial Growthmentioning
confidence: 99%
“…Several years ago, one of our researchers invented an improved method of molecular beam epitaxy called migration-enhanced epitaxy, or MEE (Horikoshi et al 1986). MEE features monoatomic control of growing layers, growth at low temperatures, growth of new and exotic materials, and growth of low-dislocationdensity GaAs on a Si substrate, as shown in Fig.…”
Section: Surface Structure Transitions Of Gaas Inas and Simentioning
confidence: 99%
“…Provided stoichiometry conditions remain fulfilled, the minimization of this flux improves the quality of stuctures in most cases, and, in the case of AlAs, smooths down surfaces and interfaces. A limiting case of optimization is provided by "Migration Enhanced Epitaxy" (MEE) [11], where the arsenic flux is interupted during the deposition of, approximately, one monolayer of group III atom. The MEE technique is not well suited for the growth of thick structures, since it requires several shutter motions per monolayer, but it may help to improve the quality of critical interfaces.…”
Section: Mbe Growth Of Gaas/alas Heterostructuresmentioning
confidence: 99%