2010
DOI: 10.1016/j.vacuum.2010.07.006
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Low pressure chemical vapor deposition of niobium coatings on graphite

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Cited by 13 publications
(3 citation statements)
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“…Chemical vapor deposition (CVD) of Nb films, in addition to sputtering [9,10,11] and epitaxy [12], were studied on silicon-carbide and graphite substrates using NbCl 5 and NbBr 5 precursors [13,14,15]. This vapor-based technique is suitable for coating the inner surface of cavities with intricate shapes.…”
Section: Introductionmentioning
confidence: 99%
“…Chemical vapor deposition (CVD) of Nb films, in addition to sputtering [9,10,11] and epitaxy [12], were studied on silicon-carbide and graphite substrates using NbCl 5 and NbBr 5 precursors [13,14,15]. This vapor-based technique is suitable for coating the inner surface of cavities with intricate shapes.…”
Section: Introductionmentioning
confidence: 99%
“…Niobium coatings can be deposited in a variety of ways: physical vapor deposition (PVD), magnetron sputtering (2)(3)(4), ion beam assisted deposition (IBAD) (5) and chemical vapor deposition (CVD) (6)(7)(8). The most convenient method for deposition coatings on spherical samples is electrolysis.…”
Section: Introductionmentioning
confidence: 99%
“…The authors of [5][6][7][8] performed a qualitative analysis of the efficiency of coating deposition across different methods. The respective criteria were divided into three groups: possibilities of obtaining and controlling the process parameters, providing quality parameters, and technological and cost indices.…”
Section: Introductionmentioning
confidence: 99%