1977
DOI: 10.1007/bf00886031
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Low-energy electron diffraction and auger electron spectroscopy study of the oxidation of Ti {0001} at room temperature

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Cited by 46 publications
(14 citation statements)
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“…2 having the lowest sputtering yield and with a transition from the C region also at O/Ti (AES) of ^.1. In addition, a change in slope at this point has been seen in the kinetics of oxidation [17]. It should be noted that…”
Section: Oxide Sputtering Kineticsmentioning
confidence: 84%
“…2 having the lowest sputtering yield and with a transition from the C region also at O/Ti (AES) of ^.1. In addition, a change in slope at this point has been seen in the kinetics of oxidation [17]. It should be noted that…”
Section: Oxide Sputtering Kineticsmentioning
confidence: 84%
“…The oxygen peak at~513 eV appears to be rather dominant, and oxygen is naturally bound to Ti since the prominent Ti peaks at~388 eV and~419 eV are very strong. Previous observations have shown that possible compounds giving such spectra are TiO and TiO 2 [28,29]. A weak vanadium peak at 473 eV was observed in addition, most likely in the form of a mixture of three various vanadium oxides.…”
Section: Aes Studiesmentioning
confidence: 87%
“…There are also disagreements regarding the stoichiometric composition of the oxides formed during the oxidation process. In some works, it is pointed out that TiO 2 grows on the surface at large exposure to oxygen [7,23], while in other works [11,15,24], the formation of TiO and Ti 2 O 3 oxides is assumed; additionally, there are other authors that declare the formation of a mixture of various oxides [6,8,12,13,25]. In [12,19], it is suggested that the composition of the oxides on the surface is affected by surface pretreatment, the oxygen pressure at which oxidation occurs [26], and the substrate temperature [13].…”
Section: Introductionmentioning
confidence: 99%