2006
DOI: 10.1063/1.2209879
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Long wavelength emitting InAs∕Ga0.85In0.15NxAs1−x quantum dots on GaAs substrate

Abstract: InAs quantum dots (QDs) overgrown by a Ga0.85In0.15NxAs1−x (0⩽x⩽0.017) layer have been realized on GaAs substrate by molecular beam epitaxy. When the nitrogen composition increases, the photoluminescence (PL) wavelength redshifts up to 1.52μm. It is shown that PL properties of InAs∕Ga0.85In0.15N0.012As0.988 QDs are improved by thermal annealing. Finally, 1.45μm PL emission with a 38.5meV full width at half maximum is obtained at room temperature.

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Cited by 27 publications
(42 citation statements)
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“…The peak emission for this sample occurs at 1515 nm, which is the longest wavelength reported for a QD bilayer and is comparable with the longest wavelengths obtained from any QDs grown on GaAs substrates. [12][13][14][15][16] The emission has a narrow PL linewidth of 22 meV, which is consistent with previous reports of narrow emission linewidths from InAs/GaAs bilayers 4,27 and indicates a high degree of uniformity of the QDs. Emission from the seed layer is suppressed due to efficient electronic coupling between the layers: room temperature emission from the seed layer is expected to be around 1250 nm for QDs grown under these conditions.…”
Section: A Effect Of Seed Layer Growth Temperaturesupporting
confidence: 79%
See 1 more Smart Citation
“…The peak emission for this sample occurs at 1515 nm, which is the longest wavelength reported for a QD bilayer and is comparable with the longest wavelengths obtained from any QDs grown on GaAs substrates. [12][13][14][15][16] The emission has a narrow PL linewidth of 22 meV, which is consistent with previous reports of narrow emission linewidths from InAs/GaAs bilayers 4,27 and indicates a high degree of uniformity of the QDs. Emission from the seed layer is suppressed due to efficient electronic coupling between the layers: room temperature emission from the seed layer is expected to be around 1250 nm for QDs grown under these conditions.…”
Section: A Effect Of Seed Layer Growth Temperaturesupporting
confidence: 79%
“…Techniques for growth of InAs/GaAs QDs with room temperature emission at 1300 nm are now well established, [9][10][11] but further extension of InAs/GaAs QD emission wavelength toward the 1550 nm telecoms window is rarely reported. [12][13][14][15][16] By variation in the growth temperature of the seed layer, the number density of seed QDs can be varied over a range of 40-300 m −2 in a simple and reproducible manner. This in turn results in a comparable change in QD density in the second layer of bilayer structures and an accompanying variation in the height of QDs.…”
Section: Introductionmentioning
confidence: 99%
“…7 Studies report an improvement of the optical properties for low N contents, accompanied by a red shift of the PL peak energy. 7,8 The quaternary alloy InGaAsN also induces strong red shifts 9,10 and long wavelength light emitting diodes have been fabricated with this approach.…”
mentioning
confidence: 99%
“…Several methods have been explored to reduce the value of DOP. These methods include (1) strain engineering by over-growing the InAs QDs with InGaAs quantum wells, also known as the strain reducing capping layers, 3 (2) inclusion of dilute impurities such as nitrogen "N," 19 antimony "Sb," 20 and phosphorous "P," 21 etc., (3) exploiting the strain interaction between the QDs in multi-layer QD stacks, 2,4,22 and (4) growing large stacks of QDs in the form of columnar QDs. 5,23 Among these techniques, the exploitation of strain interactions between the quantum dot layers in multi-layer QD stacks have shown great potential to generate polarization-insensitive optical transitions at telecommunication wavelengths.…”
mentioning
confidence: 99%