Local strain engineering in monolayer MoS&lt;inf&gt;2&lt;/inf&gt;

Tomita, Wataru; Hashimoto, Katsufumi; Wang, Ziqian; Chen, Mingwei; Hirayama, Y.

doi:10.1109/iciprm.2016.7528704

2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide &Amp; Related Materials (IPR 2016

DOI: 10.1109/iciprm.2016.7528704

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Local strain engineering in monolayer MoS<inf>2</inf>

Wataru Tomita

Katsufumi Hashimoto

Ziqian Wang

et al.

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Local strain engineering in monolayer MoS<inf>2</inf>

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