Ligand dependence in the copper-catalyzed oxidation of hydroquinones

24 peroxide [Cu I (pyr)(tpb)] 10 mol % TBHP, 1 atm O 2 , 1:2 AcOH/pyr, rt, 24 h ∼2.5 26 74 g 35 25 n-hexane aldehyde CuCl 2 , 18-crown-6 1 atm O 2 , MeCHO, CH 2 Cl 2 , 70 °C, 24 h 2.4 91 h 9 34a 26 n-decane aldehyde Cu II Cl 16 Pc-AM(PS) 3 equiv of PhCHO, MeCN, 1 atm O 2 , 50 °C 15.4 100 i 61 a See Chart 2 for ligand structures. b Also 28% cyclohexene. c Also 26% cyclohexene. d Mixture of alcohol and hydroperoxide. e Remainder of product is cyclohexene. f Approximately 93:7 of 1-adamantol/2-adamantol. g Approximately 98:2 of 1-adamantol/2-adamantol. h Afforded oxidation products in an approximately 1:1 ratio at the 2-and 3-positions. i Mixture of decanones.

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“…Stoichiometric copper(II) can be employed under anaerobic conditions, but the reaction is much slower. 1026 …”

Section: Reactions Of Phenols and Naphtholsmentioning

confidence: 99%

Aerobic Copper-Catalyzed Organic Reactions

et al. 2013

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“…[24] Also, the ability of copper metal to catalyze the oxidation of HQ to benzoquinone (BQ) has been verified in several other studies. [25][26][27] Thus, in our Cu(acac) 2 þ HQ process, HQ should have the capacity to reduce Cu(II) from Cu(acac) 2, liberating BQ as the reduction product. The forming Cu metal surface should be beneficial to promote this reaction.…”

Section: Resultsmentioning

confidence: 99%

Atomic Layer Deposition of Copper Metal Films from Cu(acac)₂ and Hydroquinone Reductant

et al. 2021

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High-quality copper metal thin films are demanded for a number of advanced technologies. Herein, a facile ALD (atomic layer deposition) process for the fabrication of Cu metal films directly from two solid readily usable precursors, copper acetylacetonate as the source of copper and hydroquinone as the reductant is reported. This process yields highly crystalline, dense, specularly reflecting, and electrically conductive Cu films with an appreciably high growth rate of 1.8 Å/cycle at deposition temperatures as low as 160 to 240 C.

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“…The PBS has several usages since it is non‐toxic to cells. Due to its phosphate content, it can directly catalyze the chemical reaction with Cu in PBS solution when the Cu films deposited directly on Si or glass . Due to this reason, we have initially deposited the ultra‐thin TiO 2 layer on the substrates to provide good adhesion to the deposited Cu film while undergoing dilution with the PBS solution in the antibacterial test.…”

Section: Methodsmentioning

confidence: 99%

Direct synthesis of magnetron sputtered nanostructured Cu films with desired properties via plasma chemistry for their efficient antibacterial application

Kim

Sahu

Xiang

et al. 2018

Plasma Processes & Polymers

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By changing the power density, the microstructure, surface morphology, surface energy, and electrical conductivity of the magnetron sputtered Cu films are tuned at a fixed Cu atomic content and the amount of Cu ion release. Data reveals that films with good crystallinity, low surface roughness, minimum surface energy, and the lowest electrical resistivity have shown a strong antibacterial response of Gram-positive bacteria Staphylococcus aureus up to 90-96%. The correlation between the plasma chemistry and film properties is established to investigate the optimized film properties. A possible mechanism is hypothesized to elucidate the observed antibacterial property from the viewpoint of charge transfer.

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Ligand dependence in the copper-catalyzed oxidation of hydroquinones

Cited by 29 publications

References 57 publications

Aerobic Copper-Catalyzed Organic Reactions

Aerobic Copper-Catalyzed Organic Reactions

Atomic Layer Deposition of Copper Metal Films from Cu(acac)₂ and Hydroquinone Reductant

Direct synthesis of magnetron sputtered nanostructured Cu films with desired properties via plasma chemistry for their efficient antibacterial application

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Ligand dependence in the copper-catalyzed oxidation of hydroquinones

Cited by 29 publications

References 57 publications

Aerobic Copper-Catalyzed Organic Reactions

Aerobic Copper-Catalyzed Organic Reactions

Atomic Layer Deposition of Copper Metal Films from Cu(acac)2 and Hydroquinone Reductant

Direct synthesis of magnetron sputtered nanostructured Cu films with desired properties via plasma chemistry for their efficient antibacterial application

Contact Info

Product

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Atomic Layer Deposition of Copper Metal Films from Cu(acac)₂ and Hydroquinone Reductant