Large-Scale Assembly of Silicon Nanowire Network-Based Devices Using Conventional Microfabrication Facilities

Heo, Kwang; Cho, Eunhee; Yang, Jee Eun; Kim, Myoung Ha; Lee, Minbaek; Lee, Byung Yang; Kwon, Soon Gu; Lee, Moon Sook; Jo, Moon Ho; Choi, Heon Jin; Hyeon, Taeghwan; Hong, Seunghun

doi:10.1021/nl802570m

Cited by 121 publications

(92 citation statements)

References 33 publications

(66 reference statements)

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“…They can also be realized experimentally. Recent developments in various epitaxy techniques allowed also for the fabrication and design of quantum nanowire networks [9,10]. In 2004 Hul et al [11] showed that quantum graphs could be successfully simulated by microwave networks.…”

Section: Methodsmentioning

confidence: 99%

Isoscattering Microwave Networks - The Role of the Boundary Conditions

et al. 2013

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The recent paper by Hul et al. (Phys. Rev. Lett. 109, 040402 (2012), see Ref. [7]) addresses an important mathematical problem whether scattering properties of wave systems are uniquely connected to their shapes? The analysis of the isoscattering microwave networks presented in this paper indicates a negative answer to this question. In this paper the sensitivity of the spectral properties of the networks to boundary conditions is tested. We show that the choice of the proper boundary conditions is extremely important in the construction of the isoscattering networks.

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Section: Methodsmentioning

confidence: 99%

Isoscattering Microwave Networks - The Role of the Boundary Conditions

et al. 2013

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“…Controlled positioning of nanomaterials (e.g., nanotubes, nanowires, and nanoparticles) is an essential process for advances in nanoelectrical devices and photonic system [1][2][3][4]. In particular, selective and addressable deposition of SWCNTs is important for high-performance CNT based-electronic devices such as light-emitting diode, flexible display, conductive film, and transistor [5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

Large-area fluidic assembly of single-walled carbon nanotubes through dip-coating and directional evaporation

Kim

Kang

2017

Micro and Nano Syst Lett

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We present a simple and scalable fluidic-assembly approach, in which bundles of single-walled carbon nanotubes (SWCNTs) are selectively aligned and deposited by directionally controlled dip-coating and solvent evaporation processes. The patterned surface with alternating regions of hydrophobic polydimethyl siloxane (PDMS) (height ~ 100 nm) strips and hydrophilic SiO 2 substrate was withdrawn vertically at a constant speed (~3 mm/min) from a solution bath containing SWCNTs (~0.1 mg/ml), allowing for directional evaporation and subsequent selective deposition of nanotube bundles along the edges of horizontally aligned PDMS strips. In addition, the fluidic assembly was applied to fabricate a field effect transistor (FET) with highly oriented SWCNTs, which demonstrate significantly higher current density as well as high turn-off ratio (T/O ratio ~ 100) as compared to that with randomly distributed carbon nanotube bundles (T/O ratio ~ <10).

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“…Several reports have demonstrated methods to assemble NWs into desired structures, including the electric/magnetic field assisted assembly method, 6,7) fluidic flow as-sembly method, [8][9] stick-slip motion method, 10,11) Langmuir-Blodgett method, [12][13][14][15] contact printing method, 16,17) and selection adhesion method. [18][19][20] Although such aforementioned methods have shown considerable progresses in assembling SiNWs into desired positions, they generally require unconventional facilities and sophisticated treatments which can be major problematic in cost-effectiveness and simplicity of the fabrication process.…”

Section: Introductionmentioning

confidence: 99%

Capillary Assembly of Silicon Nanowires Using the Removable Topographical Patterns

Hong

Lee

et al. 2014

Korean. J. Mater. Res.

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We demonstrate a simple and effective method to accurately position silicon nanowires (Si NWs) at desirable locations using drop-casting of Si NW inks; this process is suitable for applications in nanoelectronics or nanophotonics. Si NWs were assembled into a lithographically patterned sacrificial photoresist (PR) template by means of capillary interactions at the solution interface. In this process, we varied the type of solvent of the SiNW-containing solution to investigate different assembly behaviors of Si NWs in different solvents. It was found that the assembly of Si NWs was strongly dependent on the surface energy of the solvents, which leads to different evaporation modes of the Si NW solution. After Si NW assembly, the PR template was cleanly removed by thermal decomposition or chemical dissolution and the Si NWs were transferred onto the underlying substrate, preserving its position without any damage. This method enables the precise control necessary to produce highly integrated NW assemblies on all length scales since assembly template is easily fabricated with top-down lithography and removed in a simple process after bottom-up drop-casting of NWs.

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Large-Scale Assembly of Silicon Nanowire Network-Based Devices Using Conventional Microfabrication Facilities

Cited by 121 publications

References 33 publications

Isoscattering Microwave Networks - The Role of the Boundary Conditions

Isoscattering Microwave Networks - The Role of the Boundary Conditions

Large-area fluidic assembly of single-walled carbon nanotubes through dip-coating and directional evaporation

Capillary Assembly of Silicon Nanowires Using the Removable Topographical Patterns

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