DOI: 10.1021/i360068a007
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Abstract: typical oxide films. Also, we do not have the problem of electronic conduction which can complicate the metal oxide film growth kinetics. Despite these differences between the formation of organic coatings and metal oxide layers the same kinetic treatment applies to both processes.The kinetics of reduction of NO by H, over a supported ruthenium catalyst were explored in integral and differential reactor tests at atmospheric pressure and 100 to 350 O C with reactant concentrations of 60-3200 ppm of NO and 0.15-… Show more

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