MRS Proc. 2000 DOI: 10.1557/proc-624-163 View full text
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H.D. Wanzenboeck, A. Lugstein, H. Langfischer, E. Bertagnolli, M. Gritsch, H. Hutter

Abstract: ABSTRACTDirect writing by locally induced chemical vapor deposition has been applied to direct-write tailor-made microstructures of siliconoxide for modification and repair of microelectronic circuits. Focused ion beam (FIB) tools are used for locally confined deposition of dielectric material in the deep sub-µm range. State-of-the-art procedures typically provide insufficient dielectrics with high leakage currents and low breakdown voltage. The detailed investigation of the deposition mechanisms in this study…

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