Investigation of the Effect of Vacuum and Air Annealing on the Structural, Optical and Electrical Properties of Radio Frequency Sputtered WO<sub>3</sub> Thin Films
Mohammed Bousseta,
Said Elmassi,
Abdelaziz Tchenka
et al.
Abstract:Thin films of tungsten oxide were deposited on glass substrates by the radio frequency (RF) reactive sputtering from a high purity tungsten metal target (99.9%) with a diameter of 10 cm. The reactive sputtering was carried out in an argon-oxygen gas mixture containing 20% of O2 and 80% of Ar. The used RF power is 200 W while fixing the deposition time at 120 min. Finally, the prepared films were annealed at different temperatures (350 °C, 400 °C, 450 °C, 500°C and 550 °C) for 1 hour under air and under vacuum.… Show more
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