Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica

Shi, Feng; Zhong, Yaoyu; Dai, Yifan; Peng, Xiaoqiang; Xu, Mingjin; Sui, Tingting

doi:10.1364/oe.24.020842

Cited by 33 publications

(10 citation statements)

References 21 publications

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“…IBE can effectively remove or mitigate surface fracture defects, such as brittle scratches, to improve the laser damage resistance of fused silica. In the previous research, this passivation phenomenon on damage precursors during IBE has been investigated [16,18]. IBE removes the fused silica material and maintains the surface roughness with the help of the ion sputtering effect.…”

Section: Discussionmentioning

confidence: 99%

“…A peer-reviewed research has shown that IBE can remove polishing residual contamination from the surface of optics to improve LIDT while maintaining surface precision to obtain a supersmooth surface [18][19][20]. As a potential nanometer precision postprocessing technology, IBE can be utilized to mitigate nanoscale damage precursors in the present study [18]. However, many important aspects of IBE for mitigating the nanoscale damage precursors of fused silica remain controversial.…”

Section: Introductionmentioning

confidence: 88%

“…Compared with the above combined techniques, IBE does not introduce iron contamination or residual precipitations into the fused silica surface. A peer-reviewed research has shown that IBE can remove polishing residual contamination from the surface of optics to improve LIDT while maintaining surface precision to obtain a supersmooth surface [18][19][20]. As a potential nanometer precision postprocessing technology, IBE can be utilized to mitigate nanoscale damage precursors in the present study [18].…”

Section: Introductionmentioning

confidence: 89%

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Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

et al. 2020

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Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

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Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 88%

Section: Introductionmentioning

confidence: 89%

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Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

et al. 2020

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“…When the dose of ion beam was very low (<2 × 10 13 cm −2 ), the ion injection would only generate an isolated Frenkel pair (gap–vacancy pair) or a small defect cluster, i.e., vacancy defects [ 27 ]. Meanwhile, as an effective processing method to improve the laser performance [ 28 , 29 ], IBF is usually used to acquire an ultra-smooth surface [ 30 ] or is applied to the precoating cleaning of sample surface [ 31 ]. IBF was performed on the self-developed KDIBF650L-VT machine ( Figure 5 ) and atomic vacancy defects were introduced.…”

Section: Methods Of Defect Regulationmentioning

confidence: 99%

Enhancement of the Load Capacity of High-Energy Laser Monocrystalline Silicon Reflector Based on the Selection of Surface Lattice Defects

et al. 2020

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Various defects during the manufacture of a high-energy laser monocrystalline silicon reflector will increase the energy absorption rate of the substrate and worsen the optical properties. Micron-scale or larger manufacturing defects have been inhibited by mechanism study and improvement in technology, but the substrate performance still fails to satisfy the application demand. We focus on the changes in the optical properties affected by nanoscale and Angstrom lattice defects on the surface of monocrystalline silicon and acquire the expected high reflectivity and low absorptivity through deterministic control of its defect state. Based on the first principles, the band structures and optical properties of two typical defect models of monocrystalline silicon—namely, atomic vacancy and lattice dislocation—were analyzed by molecular dynamics simulations. The results showed that the reflectivity of the vacancy defect was higher than that of the dislocation defect, and elevating the proportion of the vacancy defect could improve the performance of the monocrystalline silicon in infrared (IR) band. To verify the results of simulations, the combined Ion Beam Figuring (IBF) and Chemical Mechanical Polishing (CMP) technologies were applied to introduce the vacancy defect and reduce the thickness of defect layer. After the process, the reflectivity of the monocrystalline silicon element increased by 5% in the visible light band and by 12% in the IR band. Finally, in the photothermal absorption test at 1064 nm, the photothermal absorption of the element was reduced by 80.5%. Intense laser usability on the monocrystalline silicon surface was achieved, and the effectiveness and feasibility of deterministic regulation of optical properties were verified. This concept will be widely applied in future high-energy laser system and X-ray reflectors.

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“…Unfortunately, the damage precursors in the subsurface layer such as scratches and embedded impurities are too stubborn to be avoided, even though the surface fabrication level of fused silica optics nearly approach to its limit. Recently, more efforts have been focused on removing the SSD by developing advanced surface modification processes, such as HF-based etching [ 4 , 5 ], ion beam etching (IBE) [ 6 , 7 , 8 ], magnetorheological polishing (MRF) [ 9 ] and reactive ion etching (RIE) [ 10 , 11 ]. Comparing the different attempts at surface modification for fused silica, the last-mentioned RIE technique exhibits some distinct advantages.…”

Section: Introductionmentioning

confidence: 99%

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

et al. 2018

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The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE process which can be significantly optimized by changing the plasma generating conditions such as discharge mode, etchant gas and electrode material. Additionally, an optimized RIE process is proposed to thoroughly remove polishing-introduced contamination and efficiently prevent the introduction of other contamination during the etching process. The research demonstrates the feasibility of improving the damage performance of fused silica optics by using the RIE technique.

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Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica

Cited by 33 publications

References 21 publications

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Enhancement of the Load Capacity of High-Energy Laser Monocrystalline Silicon Reflector Based on the Selection of Surface Lattice Defects

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

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