MRS Proc. 1996 DOI: 10.1557/proc-461-179 View full text
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Miri Park, Christopher Harrison, Paul M. Chaikin, Richard A. Register, Douglas Adamson, Nan Yao

Abstract: ABSTRACTThe microphase separated morphology of diblock copolymers can be used to generate well-ordered nanometer scale patterns over a large area. To achieve this goal, it is important to understand and control the behavior of diblock copolymer thin films on substrates, which can differ from the bulk behavior. We have investigated the morphologies and ordering in thin polystyrene-polybutadiene (PS-PB) diblock copolymer films on bare silicon and silicon nitride substrates, and also on polymethylmethacrylate (PM…

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