The amorphous boron-carbon-nitrogen (BCN) thin films were prepared by RF magnetron sputtering from a B 4 C target in argon and nitrogen gas ambient. The substrate temperature was varied from room temperature to 500 C. The structural and bonding characteristics were studied by X-ray photoelectron spectroscopy (XPS) and the optical properties were characterized by UV-Visible spectrophotometer. For different substrate temperatures, the optical band gaps (E opt ) ranged from 3.5-4.8 eV and refractive index were in the range of 2.66-1.5. The reported band gap values are significantly higher than the band gap values usually reported elsewhere in the literature for sputter deposited BCN thin films.Ternary compound of boron carbon and nitrogen (BCN) has gained considerable interest due to its potential applications in electronic, optoelectronic and luminescent devices 1,2 For optical applications, the deposition of BCN coatings on polymers is a promising method for protecting the polymer surface. 3 Weber et al. reported that the BCN films can be used as mask substrates for X-ray lithography due to their optical transparency. 4 The ability to control the band gap energy and the refractive index may make it possible to develop optical components such as filters and mirrors for use in the UV wavelength region.Various techniques, such as chemical vapor deposition (CVD), 5,6 pulsed laser deposition (PLD), 7,8 ion beam deposition 9 and sputtering 10 have been used to prepare BCN thin films. The BCN films of diverse compositions have been prepared by magnetron sputtering, mainly from co-targets or mixed target (h-BN and graphite). Yap et al. used nitrogen ion bombardment to adjust the quantities of C and BN plumes from graphite and h-BN targets. 11 Numerous works have been reported describing the bonding characteristic of BCN films. However, little attention has been paid to the study the correlation between the optical properties and the deposition conditions. M. K. Lei et al. studied the optical properties of BCN films with different deposition temperatures. 12 In this study they used magnetron sputtering from a mixed target of h-BN and graphite to deposit BCN films. The reported band gap values by them varied from 1.48 to 2.00 eV as the substrate temperature was increased from 250 to 550 C. Sputtering from a mixed target of h-BN and graphite suffers from the limitation of less boron incorporation in the films which results in minimal variation in the optical band gaps.No systematic results have been reported on the correlation between the optical properties of the BCN films and the deposition temperature prepared by sputtering from a single B 4 C target. Hence, in this paper we report for the first time the effect of substrate heating temperature on the optical properties of the BCN films prepared by sputtering from B 4 C target. The band gaps reported in this study are by far the highest band gaps observed for BCN films prepared by sputtering. The composition and structure of the films were examined by X-ray photoelectron s...