We have nickel doped boron carbide grown by plasma enhanced chemical vapor deposition. The source gas closo-1,2-dicarbadodecaborane ͑ortho-carborane͒ was used to grow the boron carbide, while nickelocene ͓Ni͑C 5 H 5 ͒ 2 ͔ was used to introduce nickel into the growing film. The doping of nickel transformed a p-type, B 5 C material, relative to lightly doped n-type silicon, to an n-type material. Both n-n heterojunction diodes and n-p heterojunction diodes were constructed, using as substrates n-and p-type Si͑111͒, respectively. With sufficient partial pressures of nickelocene in the plasma reactor, diodes with characteristic tunnel diode behavior can be successfully fabricated.