1985
DOI: 10.1016/0039-6028(85)90430-3
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Interaction of oxygen with a Ru(OO1) surface

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Cited by 98 publications
(48 citation statements)
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“…(1)] and is calculated here using transfer matrix techniques. Regarding the sticking coefficient, we note that dissociation is not activated initially, but at (local) coverages of u * 0.5, it is hindered by an energy barrier [6,12]. Under these circumstances, to obtain the coverage and temperature dependence of the sticking coefficient ab initio would be a significant undertaking.…”
mentioning
confidence: 99%
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“…(1)] and is calculated here using transfer matrix techniques. Regarding the sticking coefficient, we note that dissociation is not activated initially, but at (local) coverages of u * 0.5, it is hindered by an energy barrier [6,12]. Under these circumstances, to obtain the coverage and temperature dependence of the sticking coefficient ab initio would be a significant undertaking.…”
mentioning
confidence: 99%
“…On doing this, we present a consistent first-principles-based approach for calculation of the thermodynamic and kinetic properties of an adsorbate, such as heats of adsorption, temperature programmed desorption (TPD) spectra, and the surface phase diagram. We have chosen the system of oxygen at Ru(0001) for which detailed structural [4][5][6][7][8][9], thermodynamic [10], and kinetic data [11,12] exist. We will show that, with the present approach, a realistic description of these physical properties is indeed feasible.…”
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confidence: 99%
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“…Particularly the sharp drop after reaching a coverage of about 0.5 ML at Ru(0001) and Rh(111) leads to an apparent uptake saturation, when employing low gas exposures as typical for many early ultra-high vacuum (UHV) surface science studies. 12,13,14 DFT calculations predicted, however, that much higher coverages should still be possible 15,16,17 , and Fig. 2 shows such data for some selected adsorbate configurations spanning the whole coverage range up to 1 ML 18 .…”
Section: A Formation Of Adlayersmentioning
confidence: 97%
“…For the direct process, the dissociation occurs just on the first initial collision of the gas molecule with the surface. Although it is the most common dissociative chemisorption process of gases such as H2 and N2 on metal surfaces, 212 O2 chemisorption on Ru undergoes via a precursor-mediated mechanism, 216 the indirect process. For the indirect process, the dissociation is preceded by the formation of a surface precursor that either diffuses freely across the surface to find a favorable dissociation site, or its mobility is limited to the place where the precursor is initially formed.…”
Section: Introductionmentioning
confidence: 99%